Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Michael T. Stocker (Fed)

Michael Stocker is a Physical Scientist with the Surface and Interface Metrology Group at the National Institute of Standards and Technology (NIST). He has an A.A.S. in Metrology and B.S. in Computer Science and focuses on objective measurement and analysis of firearm toolmarks. He has been with the group since 2001 and has led a variety of optics-related research projects in the following fields; semiconductor, fuel cell manufacturing, and ballistic imaging. He has extensive experience in dimensional metrology, optical microscopy methods, precision engineering, and measurement uncertainty analysis. He is currently a Technical Advisor to the Association of Firearm and Toolmark Examiners (AFTE), chair of the Quality Assurance subcommittee for the Technical Working Group for 3D Toolmark Technologies (TWG3D2T) and a member of the Novel Technology Task Group for the Firearm and Toolmark Subcommittee within NIST’s Organization of Scientific Area Committees (OSAC). His current work includes developing physical reference artifacts for calibrating and evaluating performance of 3D optical surface topography instruments in addition to studying the size and reproducibility of individualizing features on firearm toolmarking surfaces.

Publications

Results of an international photomask linewidth comparison of NIST and PTB

Author(s)
Bernd Bodermann, Detleff Bergmann, Egbert Buhr, Wolfgang Haebler-Grohne, Harald Bosse, James E. Potzick, Ronald G. Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Ndubuisi George Orji
In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral

Photomask metrology using a 193 nm scatterfield microscope

Author(s)
Richard Quintanilha, Bryan M. Barnes, Martin Y. Sohn, Lowell P. Howard, Richard M. Silver, James E. Potzick, Michael T. Stocker
The current photomask linewidth Standard Reference Material (SRM) supplied by the National Institute of Standards and Technology (NIST), SRM 2059, is the fifth

International photomask linewidth comparison by NIST and PTB

Author(s)
James E. Potzick, Ronald G. Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Egbert Buhr, Bernd Bodermann, Wolfgang Hassler-Grohne, Harald Bosse, C.G. Frase
In preparation of the international Nano1 linewidth comparison on photomasks between 8 national metrology institutes, NIST and PTB have started a bilateral
Created June 4, 2019, Updated June 15, 2021