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Search Publications by: Eric K. Lin (Fed)

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Displaying 76 - 100 of 199

Effects of Humidity on Unencapsulated Poly(thiophene) Thin Film Transistors

March 13, 2006
Author(s)
Michael L. Chabinyc, Fred Endicott, B D. Vogt, Dean DeLongchamp, Eric K. Lin, Yiliang Wu, Ping Liu, Beng S. Ong
The effects of humidity on unencapsulated polymeric thin-film transistors (TFTs) were investigated. TFTs were fabricated on glass substrates with inorganic gate dielectric and a semiconducting layer of poly[5,5 -bis(3-dodecyl-2-thienyl)-2,2 -bithiophene]

Fundamentals of the Reaction-Diffusion Process in Model EUV Photoresists

March 1, 2006
Author(s)
Kristopher Lavery, George Thompson, Hai Deng, D S. Fryer, Kwang-Woo Choi, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, Michael Leeson, Heidi B. Cao
More demanding requirements are being made of photoresist materials for fabrication of nanostructures as the feature critical dimensions (CD) decrease. For EUV resists, control of line width roughness (LWR) and high resist sensitivity are key requirements

Dissolution Fundamentals of 193-nm Methacrylate Based Photoresists

February 19, 2006
Author(s)
Ashwin Rao, Shuhui Kang, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, Karen Turnquest, W D. Hinsberg
The dissolution of partially deprotected chemically amplified photoresists is the final step in printing lithographic features. Since this process step can be tuned independently from the design of the photoresist chemistry, fundamental measurements of the

Effect of Initial Resist Thickness on Residual Layer Thickness of Nanoimprinted Structures

December 1, 2005
Author(s)
Hae-Jeong Lee, Hyun Wook Ro, Christopher L. Soles, Ronald L. Jones, Eric K. Lin, Wen-Li Wu, Daniel R. Hines
Accurate quantification and control of the residual layer thickness is a critical challenge to achieving sub-50 nm patterning with nanoimprint lithography. While characterization to within a few nanometers is essential, there is currently a lack of

Self-Assembly, Molecular Ordering, and Charge Mobility in Solution-Processed Ultrathin Oligothiophene Films

November 29, 2005
Author(s)
A R. Murphy, Paul C. Chang, Priscilla VanDyke, J Liu, J M. Frechet, V Subramanian, Dean DeLongchamp, S Sambasivan, Daniel A. Fischer, Eric K. Lin
Symmetrical quarter-(T4), penta-(T5), sexi-(T6), and heptathiophene (T7) oligomers containing thermally removable aliphatic ester solubilizing groups were synthesized, and their UV-vis and thermal characteristics were compared. Spun-cast thin films of each

Variations in Semiconducting Polymer Microstructure and Hole Mobility With Spin-Coating Speed

November 15, 2005
Author(s)
Dean M. DeLongchamp, Brandon M. Vogel, Youngsuk Jung, Curt A. Richter, Oleg A. Kirillov, Jan Obrzut, Daniel A. Fischer, S Sambasivan, Marc Gurau, Lee J. Richter, Eric K. Lin
Organic semiconductors permit low-cost processing methods such as spin-coating, dip coating, or ink-jet printing onto flexible substrates. However, the performance of these materials in devices is difficult to control and new processing methods can deliver

Direct Correlation of Organic Semiconductor Film Structure to Field-Effect Mobility

August 1, 2005
Author(s)
Dean M. DeLongchamp, S Sambasivan, Daniel A. Fischer, Eric K. Lin, Paul C. Chang, A R. Murphy, J M. Frechet, V Subramanian
Recent efforts towards the large-scale adoption of organic electronics have focused on maximizing device performance using new molecular designs and processing strategies. However, rational design and systematic progress are hindered by insufficient

Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films

July 19, 2005
Author(s)
Vivek M. Prabhu, B D. Vogt, Wen-Li Wu, Eric K. Lin, Jack F. Douglas, Sushil K. Satija, D L. Goldfarb, H Ito
The depth profile of the counterion concentration within thin polyelectrolyte films was measured in situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution.Wefind substantial counterion

Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films

May 20, 2005
Author(s)
Vivek M. Prabhu, B D. Vogt, Wen-Li Wu, Jack F. Douglas, Eric K. Lin, Sushil K. Satija, D M. Goldfarb, H Ito
A depth profile of the counterion concentration within thin polyelectrolyte films was measured in-situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution. We find a substantial counterion

Characterization of Ordered Mesoporous Silica Films Using Small-Angle Neutron Scattering and X Ray Porosimetry

March 1, 2005
Author(s)
B D. Vogt, R A. Pai, V. J. Lee, R C. Hedden, Christopher L. Soles, Wen-Li Wu, Eric K. Lin, Barry J. Bauer, J J. Watkins
Ordered mesoporous silica films were synthesized using pre-organized block copolymer templates in supercritical carbon dioxide. Poly(ethylene oxide-block-propylene oxide-block-ethylene oxide), PEO-bPPO-b-PEO,films doped with p-toluenesulfonic acid (p-TSA)

X-ray Absorption Spectroscopy to Probe Surface Composition and Surface Deprotection in Photoresist Films

March 1, 2005
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A. Fischer, S Sambasivan, Eric K. Lin, Ronald L. Jones, Christopher Soles, Wen-Li Wu, D M. Goldfarb, M Angelopoulos
We utilize near edge x-ray absorption fine structure spectroscopy (NEXAFS) to provide chemical insight into surface chemical effects in model photo-resist films. First, NEXAFS was used to examine the resist/air interface including surface segregration of a

Characterization of Ordered Mesoporous Silica Films Using Small Angle Neutron Scattering and X-Ray Porosimetry

February 23, 2005
Author(s)
B D. Vogt, R A. Pai, Hae-Jeong Lee, R C. Hedden, Christopher L. Soles, Wen-Li Wu, Eric K. Lin, Barry J. Bauer, J J. Watkins
Ordered mesoporous silica films were synthesized using pre-organized block copolymer templates in supercritical carbon dioxide. Poly(ethylene oxide-block-propylene oxide-block-ethylene oxide), PEO-b-PPO-b-PEO, films doped with p-toluenesulfonic acid (p TSA

Water Distribution Within Immersed Polymer Films

February 1, 2005
Author(s)
B D. Vogt, Christopher Soles, Vivek Prabhu, Sushil K. Satija, Eric K. Lin, Wen-Li Wu
The emergence of immersion lithography as a potential alternative for the extension of current lithography tools will require a fundamental understanding of the interactions between the photoresist and the immersion liquid such as water. The water

Water Immersion of Model Photoresists: Interfacial Influences on Water Concentration and Surface Morphology

February 1, 2005
Author(s)
B D. Vogt, D L. Goldfarb, M Angelopoulos, Christopher Soles, C M. Wang, Vivek Prabhu, P M. McGuiggan, Jack F. Douglas, Eric K. Lin, Wen-Li Wu, Sushil K. Satija
Immersion lithography has emerged as an alternative to the 157 nm node and as such understanding of the interactions between the photoresist and immersion fluid (water) has become a pressing issue. The water concentration within the model photoresist films