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Displaying 51 - 75 of 231

Accelerated Lifetime Metrology of EUV Multilayer Mirrors in Hydrocarbon Environments

October 1, 2008
Author(s)
Shannon B. Hill, Nadir S. Faradzhev, Charles S. Tarrio, Thomas B. Lucatorto, T. E. Madey, B. V. Yakshinskiy, E. Loginova, S. Yulin
The ability to predict the rate of reflectivity loss of capped multilayer mirrors (MLMs) under various conditions of ambient vacuum composition, intensity, and previous dose is crucial to solving the mirror lifetime problem in an EUV stepper. Previous

Quantitative Measurement of Outgas Products From EUV Photoresists

March 14, 2008
Author(s)
Charles S. Tarrio, Bruce A. Benner Jr, Robert E. Vest, Steven E. Grantham, Shannon B. Hill, Thomas B. Lucatorto, Jay H. Hendricks, Patrick J. Abbott, Greg Denbeaux, Alin Antohe, Chimaobi Mbanaso, Kevin Orbek
The photon-stimulated emission of organic molecules from the photoresist during exposure is a serious problem for extreme- ultraviolet lithography (EUVL) because the adsorption of the outgassing products on the EUV optics can lead to carbonization and

Multilayers for Next Generation X-Ray Sources

December 1, 2007
Author(s)
Sasa Bajt, H N. Chapman, E Spiller, S Hau-Riege, J Alameda, A J. Nelson, C C. Walton, B Kjornrattanawanich, Andrew Aquila, Charles Tarrio, Steven Grantham
Multilayers are artificially layered structures that can be used to create optics and optical elements for a broad range of x-ray wavelengths, or can be optimized for other applications. The development of next generation x-ray sources (synchrotrons and x

High Effeciency Fast Scintillators for the Development of Optical Soft X-Ray Arrays for Laboratory Plasma Diagnostics

August 20, 2007
Author(s)
L F. Delgado-Aparicio, R Vero, D Stutman, M Finkenthal, K Tritz, G Suliman, H W. Moos, R Kaita, R Majeski, B Stratton, L Roquemore, D Johnson, Charles Tarrio
Scintillator-based optical soft x-ray (OSXR) arrays may in the near future, replace the conventional diode arrays used for plasma imaging, tomographic reconstruction, magnetohydrodynamics, transport and turbulence studies in magnetically confined fusion

Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography

September 1, 2006
Author(s)
M Nieto, J P. Allain, V Titov, M R. Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles Tarrio, Yaniv Barad, Steven Grantham, Thomas B. Lucatorto, Bryan Rice
The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To study
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