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Displaying 26 - 50 of 117

EUVL dosimetry at NIST

March 13, 2009
Author(s)
Charles S. Tarrio, Steven E. Grantham, Marc J. Cangemi, Robert E. Vest, Thomas B. Lucatorto, Noreen Harned
As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three extreme

Accelerated Lifetime Metrology of EUV Multilayer Mirrors in Hydrocarbon Environments

October 1, 2008
Author(s)
Shannon B. Hill, Nadir S. Faradzhev, Charles S. Tarrio, Thomas B. Lucatorto, T. E. Madey, B. V. Yakshinskiy, E. Loginova, S. Yulin
The ability to predict the rate of reflectivity loss of capped multilayer mirrors (MLMs) under various conditions of ambient vacuum composition, intensity, and previous dose is crucial to solving the mirror lifetime problem in an EUV stepper. Previous

Quantitative Measurement of Outgas Products From EUV Photoresists

March 14, 2008
Author(s)
Charles S. Tarrio, Bruce A. Benner Jr, Robert E. Vest, Steven E. Grantham, Shannon B. Hill, Thomas B. Lucatorto, Jay H. Hendricks, Patrick J. Abbott, Greg Denbeaux, Alin Antohe, Chimaobi Mbanaso, Kevin Orbek
The photon-stimulated emission of organic molecules from the photoresist during exposure is a serious problem for extreme- ultraviolet lithography (EUVL) because the adsorption of the outgassing products on the EUV optics can lead to carbonization and

Multilayers for Next Generation X-Ray Sources

December 1, 2007
Author(s)
Sasa Bajt, H N. Chapman, E Spiller, S Hau-Riege, J Alameda, A J. Nelson, C C. Walton, B Kjornrattanawanich, Andrew Aquila, Charles Tarrio, Steven Grantham
Multilayers are artificially layered structures that can be used to create optics and optical elements for a broad range of x-ray wavelengths, or can be optimized for other applications. The development of next generation x-ray sources (synchrotrons and x

High Effeciency Fast Scintillators for the Development of Optical Soft X-Ray Arrays for Laboratory Plasma Diagnostics

August 20, 2007
Author(s)
L F. Delgado-Aparicio, R Vero, D Stutman, M Finkenthal, K Tritz, G Suliman, H W. Moos, R Kaita, R Majeski, B Stratton, L Roquemore, D Johnson, Charles Tarrio
Scintillator-based optical soft x-ray (OSXR) arrays may in the near future, replace the conventional diode arrays used for plasma imaging, tomographic reconstruction, magnetohydrodynamics, transport and turbulence studies in magnetically confined fusion

Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography

September 1, 2006
Author(s)
M Nieto, J P. Allain, V Titov, M R. Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles Tarrio, Yaniv Barad, Steven Grantham, Thomas B. Lucatorto, Bryan Rice
The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To study

Optics for Extreme Ultraviolet Lithography

November 1, 2005
Author(s)
Steven E. Grantham, Charles S. Tarrio, Shannon B. Hill, Thomas B. Lucatorto
Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a major

A Simple Transfer-Optics System for an Extreme-Ultraviolet Synchrotron Beamline

April 1, 2005
Author(s)
Charles S. Tarrio, Steven E. Grantham, Robert E. Vest, K Liu
Beamlines at synchrotron radiation facilities often have interchangeable endstations to allow several different experiments to use the output of a single monochromator. However, for endstations that are sufficiently large, this is not possible. We have

Improved Radiometry For Extreme-Ultraviolet Lithography

November 1, 2004
Author(s)
Charles S. Tarrio, Robert E. Vest, Steven E. Grantham, K Liu, Thomas B. Lucatorto, Ping-Shine Shaw
The absolute cryogenic radiometer (ACR), an electrical-substitution-based detector, is the most accurate method for measurement of radiant power in the extreme ultraviolet. At the National Institute of Standards and Technology, ACR-based measurements are

Extreme-Ultraviolet Efficiency Measurements of Freestanding Transmission Gratings

July 1, 2004
Author(s)
D R. McMullin, D L. Judge, Charles Tarrio, Robert E. Vest, F Hanser
We report the results of transmission and diffraction measurements at EUV wavelengths (4-30 nm) for two gratings, one with a line density of 5000 mm -1 and the other 2500 mm -1. Measurements were made to provide absolute transmission efficiency at central

Facility for Pulsed Extreme Ultraviolet Detector Calibration

October 8, 2003
Author(s)
Steven E. Grantham, Robert E. Vest, Charles S. Tarrio, Thomas B. Lucatorto
All of the Extreme Ultraviolet light sources currently under consideration for Extreme Ultraviolet lithography are based on plasmas that emit radiation with a wavelength of approximately 13.4 nm. These sources whether they are produced by a discharge or
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