Tarrio, C.
(2009),
Method for the characterization of extreme-ultraviolet photoresist outgassing, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=842566
(Accessed December 11, 2024)
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Method for the characterization of extreme-ultraviolet photoresist outgassing
Published
Author(s)
Abstract
Outgassing from photoresists illuminated by extreme ultraviolet radiation can lead to degradation of the very expensive multilayer- coated optics in an extreme ultraviolet stepper. Reliable quantification of the various organic molecules outgassed by photoresists has been a challenging goal. We have designed a compact system for this measurement. In the first step, the total number of molecules emitted by the photoresist is measured using a pressure- rise method in a closed vacuum chamber, with the pressure measured by mechanical means using a capacitance displacement gauge. To provide identification and relative abundances, the outgassed molecules are then collected in an evacuated trap cooled by liquid nitrogen for subsequent analysis by gas chromatography with mass spectrometry. We will discuss the design and performance of the system.Citation
Journal of Research (NIST JRES) -
Volume
114
NIST Pub Series
Pub Type
NIST Pubs
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Keywords
EUV lithography, gas chromatography, outgassing, photoresists, vacuum measurement
Citation
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Created May 1, 2009, Updated November 14, 2018