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Method for the characterization of extreme-ultraviolet photoresist outgassing

Published

Author(s)

Charles S. Tarrio

Abstract

Outgassing from photoresists illuminated by extreme ultraviolet radiation can lead to degradation of the very expensive multilayer- coated optics in an extreme ultraviolet stepper. Reliable quantification of the various organic molecules outgassed by photoresists has been a challenging goal. We have designed a compact system for this measurement. In the first step, the total number of molecules emitted by the photoresist is measured using a pressure- rise method in a closed vacuum chamber, with the pressure measured by mechanical means using a capacitance displacement gauge. To provide identification and relative abundances, the outgassed molecules are then collected in an evacuated trap cooled by liquid nitrogen for subsequent analysis by gas chromatography with mass spectrometry. We will discuss the design and performance of the system.
Citation
Journal of Research (NIST JRES) -
Volume
114

Keywords

EUV lithography, gas chromatography, outgassing, photoresists, vacuum measurement

Citation

Tarrio, C. (2009), Method for the characterization of extreme-ultraviolet photoresist outgassing, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=842566 (Accessed July 6, 2022)
Created May 1, 2009, Updated November 14, 2018