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Displaying 76 - 100 of 231

Optics for Extreme Ultraviolet Lithography

November 1, 2005
Author(s)
Steven E. Grantham, Charles S. Tarrio, Shannon B. Hill, Thomas B. Lucatorto
Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a major

A Simple Transfer-Optics System for an Extreme-Ultraviolet Synchrotron Beamline

April 1, 2005
Author(s)
Charles S. Tarrio, Steven E. Grantham, Robert E. Vest, K Liu
Beamlines at synchrotron radiation facilities often have interchangeable endstations to allow several different experiments to use the output of a single monochromator. However, for endstations that are sufficiently large, this is not possible. We have

Improved Radiometry For Extreme-Ultraviolet Lithography

November 1, 2004
Author(s)
Charles S. Tarrio, Robert E. Vest, Steven E. Grantham, K Liu, Thomas B. Lucatorto, Ping-Shine Shaw
The absolute cryogenic radiometer (ACR), an electrical-substitution-based detector, is the most accurate method for measurement of radiant power in the extreme ultraviolet. At the National Institute of Standards and Technology, ACR-based measurements are

Extreme-Ultraviolet Efficiency Measurements of Freestanding Transmission Gratings

July 1, 2004
Author(s)
D R. McMullin, D L. Judge, Charles Tarrio, Robert E. Vest, F Hanser
We report the results of transmission and diffraction measurements at EUV wavelengths (4-30 nm) for two gratings, one with a line density of 5000 mm -1 and the other 2500 mm -1. Measurements were made to provide absolute transmission efficiency at central

Facility for Pulsed Extreme Ultraviolet Detector Calibration

October 8, 2003
Author(s)
Steven E. Grantham, Robert E. Vest, Charles S. Tarrio, Thomas B. Lucatorto
All of the Extreme Ultraviolet light sources currently under consideration for Extreme Ultraviolet lithography are based on plasmas that emit radiation with a wavelength of approximately 13.4 nm. These sources whether they are produced by a discharge or

Design and Performance of Capping Layers for Extreme-Ulatraviolet Multilayer Mirrors

October 1, 2003
Author(s)
Sasa Bajt, H N. Chapman, Nhan Nguyen, J Alameda, J C. Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles Tarrio, Steven Grantham
Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity above

40 Years of Metrology With Synchrotron Radiation at SURF

September 1, 2003
Author(s)
Uwe Arp, Steven E. Grantham, Simon G. Kaplan, Ping-Shine Shaw, Charles S. Tarrio, Robert E. Vest
the advantages of a compact synchrotron radiation source like the Synchrotron Ultraviolet Radiation Facility for metrology in the ultraviolet and extreme ultraviolet are shown. The capabilities of the different experimental stations are explained and
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