Tarrio, C.
, Watts, R.
, Lucatorto, T.
, Slaughter, J.
and Falco, C.
(1998),
Optical Constants of In-Situ-Deposited Films of Important Extreme-Ultraviolet Multilayer Mirror Materials, Applied Optics
(Accessed April 25, 2024)
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Optical Constants of In-Situ-Deposited Films of Important Extreme-Ultraviolet Multilayer Mirror Materials
Published
Author(s)
, , , J M. Slaughter, Charles M. Falco
Abstract
We have performed angle-dependent reflectance measurements of in-situ magnetron sputtered films of B4C, C, Mo, Si, and W. The Fresnel relations were used to determine the complex index of refraction from the reflectance data in the region of approximately 35-150 eV. In the cases of Si, C, and B4C, we found excellent agreement with published data. However, in Mo and W, we found that the optical properties from 35 to 60 eV differ significantly from those in the literature.Citation
Applied Optics
Volume
37
Issue
No. 19
Pub Type
Journals
Keywords
extreme ultraviolet, index of refraction, multilayer mirrors, optical constants, thin films
Citation
Created July 1, 1998, Updated February 17, 2017