Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Optical Constants of In-Situ-Deposited Films of Important Extreme-Ultraviolet Multilayer Mirror Materials

Published

Author(s)

Charles S. Tarrio, R N. Watts, Thomas B. Lucatorto, J M. Slaughter, Charles M. Falco

Abstract

We have performed angle-dependent reflectance measurements of in-situ magnetron sputtered films of B4C, C, Mo, Si, and W. The Fresnel relations were used to determine the complex index of refraction from the reflectance data in the region of approximately 35-150 eV. In the cases of Si, C, and B4C, we found excellent agreement with published data. However, in Mo and W, we found that the optical properties from 35 to 60 eV differ significantly from those in the literature.
Citation
Applied Optics
Volume
37
Issue
No. 19

Keywords

extreme ultraviolet, index of refraction, multilayer mirrors, optical constants, thin films

Citation

Tarrio, C. , Watts, R. , Lucatorto, T. , Slaughter, J. and Falco, C. (1998), Optical Constants of In-Situ-Deposited Films of Important Extreme-Ultraviolet Multilayer Mirror Materials, Applied Optics (Accessed October 26, 2021)
Created July 1, 1998, Updated February 17, 2017