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PUBLICATIONS

Extreme Ultraviolet Metrology at SURF III

Published

Author(s)

Charles S. Tarrio, Robert E. Vest, S Grantham, Thomas B. Lucatorto

Abstract

The last two decades have seen the development normal-incidence multiplayer mirrors and semiconductor photodiodes for extreme ultraviolet (EUV) radiation. Applications such as in astrophysics, lithography, and plasma physics, require precise calibrations of the associated instrumentation.
Citation
Synchrotron Radiation News
Volume
14
Pub Type
Journals

Keywords

extreme ultraviolet, metrology, radiometry, reflectometry, source-based radiometry

Citation

Tarrio, C. , Vest, R. , Grantham, S. and Lucatorto, T. (2001), Extreme Ultraviolet Metrology at SURF III, Synchrotron Radiation News (Accessed May 10, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2001, Updated February 17, 2017