Tarrio, C.
, Vest, R.
, Grantham, S.
and Lucatorto, T.
(2001),
Extreme Ultraviolet Metrology at SURF III, Synchrotron Radiation News
(Accessed February 6, 2026)
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Extreme Ultraviolet Metrology at SURF III
Published
Author(s)
, , S Grantham,
Abstract
The last two decades have seen the development normal-incidence multiplayer mirrors and semiconductor photodiodes for extreme ultraviolet (EUV) radiation. Applications such as in astrophysics, lithography, and plasma physics, require precise calibrations of the associated instrumentation.Citation
Synchrotron Radiation News
Volume
14
Pub Type
Journals
Keywords
extreme ultraviolet, metrology, radiometry, reflectometry, source-based radiometry
Citation
Issues
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Created January 1, 2001, Updated February 17, 2017