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Towards high accuracy reflectometry for extreme-ultraviolet lithography,

Published

Author(s)

Charles S. Tarrio, Steven E. Grantham, M B. Squires, Robert E. Vest, Thomas B. Lucatorto
Citation
Journal of Research of the National Institute of Standards and Technology
Volume
108

Citation

Tarrio, C. , Grantham, S. , Squires, M. , Vest, R. and Lucatorto, T. (2003), Towards high accuracy reflectometry for extreme-ultraviolet lithography,, Journal of Research of the National Institute of Standards and Technology (Accessed March 29, 2024)
Created January 1, 2003, Updated February 17, 2017