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PUBLICATIONS

Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology

Published

Author(s)

Steven E. Grantham, Charles S. Tarrio, Thomas B. Lucatorto
Citation
Journal of Vacuum Science and Technology
Volume
20
Pub Type
Journals

Citation

Grantham, S. , Tarrio, C. and Lucatorto, T. (2002), Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology, Journal of Vacuum Science and Technology (Accessed October 7, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created January 1, 2002, Updated February 17, 2017
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