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Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology

Published

Author(s)

Steven E. Grantham, Charles S. Tarrio, Thomas B. Lucatorto
Citation
Journal of Vacuum Science and Technology
Volume
20

Citation

Grantham, S. , Tarrio, C. and Lucatorto, T. (2002), Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology, Journal of Vacuum Science and Technology (Accessed April 23, 2024)
Created January 1, 2002, Updated February 17, 2017