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Design and Performance of Capping Layers for EUV Multilayer Mirrors

Published

Author(s)

Sasa Bajt, H N. Chapman, Nhan Nguyen, J Alameda, J C. Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles Tarrio, Steven Grantham

Abstract

The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in designing the protective capping layer coatings, understanding their performance and estimating their lifetimes based on accelerated electron beam and EUV exposure studies. Our current capping layer coatings have about 40 times longer lifetimes than Si-capped multiplayer optics. Nevertheless, the lifetime of current Ru-capped multilayers is too short to satisfy commercial tool requirements and further improvements are essential.
Proceedings Title
Emerging Lithographic Technologies, Conference | 7th | Emerging Lithographic Technologies VII | SPIE
Volume
5037
Conference Dates
February 1, 2003
Conference Location
Undefined
Conference Title
Proceedings of SPIE--the International Society for Optical Engineering

Keywords

capping layer, extreme ultraviolet (EUV) lithography, multilayers, optics, oxidation resistance, reflectivity, ruthenium

Citation

Bajt, S. , Chapman, H. , Nguyen, N. , Alameda, J. , Robinson, J. , Malinowski, M. , Gullikson, E. , Aquila, A. , Tarrio, C. and Grantham, S. (2003), Design and Performance of Capping Layers for EUV Multilayer Mirrors, Emerging Lithographic Technologies, Conference | 7th | Emerging Lithographic Technologies VII | SPIE, Undefined (Accessed July 15, 2024)

Issues

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Created May 31, 2003, Updated October 12, 2021