Design and Performance of Capping Layers for EUV Multilayer Mirrors

Published

June 1, 2003

Author(s)

Sasa Bajt, H N. Chapman, Nhan Nguyen, J Alameda, J C. Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles Tarrio, Steven Grantham

Abstract

The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in designing the protective capping layer coatings, understanding their performance and estimating their lifetimes based on accelerated electron beam and EUV exposure studies. Our current capping layer coatings have about 40 times longer lifetimes than Si-capped multiplayer optics. Nevertheless, the lifetime of current Ru-capped multilayers is too short to satisfy commercial tool requirements and further improvements are essential.

Proceedings Title

Emerging Lithographic Technologies, Conference | 7th | Emerging Lithographic Technologies VII | SPIE

Volume

5037

Conference Dates

February 1, 2003

Conference Location

Undefined

Conference Title

Proceedings of SPIE--the International Society for Optical Engineering

Pub Type

Conferences

Keywords

capping layer, extreme ultraviolet (EUV) lithography, multilayers, optics, oxidation resistance, reflectivity, ruthenium

Citation

Bajt, S. , Chapman, H. , Nguyen, N. , Alameda, J. , Robinson, J. , Malinowski, M. , Gullikson, E. , Aquila, A. , Tarrio, C. and Grantham, S. (2003), Design and Performance of Capping Layers for EUV Multilayer Mirrors, Emerging Lithographic Technologies, Conference | 7th | Emerging Lithographic Technologies VII | SPIE, Undefined (Accessed October 27, 2025)