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Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application
Published
Author(s)
Zachary H. Levine, S Grantham, Charles S. Tarrio, D Paterson, I McNulty, T M. Levin, A L. Ankudinov, J J. Rehr
Abstract
The mass absorption coefficient of tungsten and tantalum was measured with soft x-ray photons from 1450 eV to 2350 eV using an undulator source. This includes the M3, M4, and M5 absorption edges. X-ray absorption fine structure was calculated within a real-space multiple scattering formalism; the predicted structure was observed for tungsten and to a lesser degree tantalum as well.Separately, the effects of dynamic screening were observed as shown by an atomic calculation within the relativistic time-dependent local-density approximation.Dynamic screening effects influence the spectra at the 25 % level and are observed for both tungsten and tantalum. We applied these results to characterize spatially-resolved spectra of a tungsten integrated circuit interconnect obtained using a scanning transmission x-ray microscope. The results indicate tungsten fiducial markers were deposited into silica trenches with a depths of 50% and 60% of the markers' heights.
Levine, Z.
, Grantham, S.
, Tarrio, C.
, Paterson, D.
, McNulty, I.
, Levin, T.
, Ankudinov, A.
and Rehr, J.
(2003),
Mass Absorption Coefficient of Tungsten and Tantalum, 1450 eV to 2350 eV: Experiment, Theory, and Application, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed October 10, 2025)