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Displaying 1976 - 2000 of 2724

Determination of Optimal Parameters for CD-SEM Measurement of Line Edge Roughness

May 1, 2004
Author(s)
B Bunday, M R. Bishop, D Mccormack, John S. Villarrubia, Andras Vladar, Theodore V. Vorburger, Ndubuisi George Orji, J Allgair
The measurement of line-edge roughness (LER) has recently become a topic of concern in the litho-metrology community and the semiconductor industry as a whole. The Advanced Metrology Advisory Group (AMAG), a council composed of the chief metrologists from

Dimensional Metrology of Resist Lines Using a SEM Model-Based Library Approach

May 1, 2004
Author(s)
John S. Villarrubia, Andras Vladar, B Bunday, M R. Bishop
The widths of 284 lines in a 193 nm resist were measured by two methods and the results compared. One method was scanning electron microscopy (SEM) of cross-sections. The other was a model-based library (MBL) approach in which top-down CD-SEM line scans of

Evaluation of New In-Chip and Arrayed Line Overlay

May 1, 2004
Author(s)
Ravikiran Attota, Richard M. Silver, M R. Bishop, Egon Marx, Jay S. Jun, Michael T. Stocker, M P. Davidson, Robert D. Larrabee
Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device area

High-Resolution Optical Overlay Metrology

May 1, 2004
Author(s)
Richard M. Silver, Ravikiran Attota, M R. Bishop, Jay S. Jun, Egon Marx, M P. Davidson, Robert D. Larrabee
Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the conventional resolution limitations encountered in well-defined edge-to-edge measurements using

Improving the Uncertainty of Photomask Linewidth Measurements

May 1, 2004
Author(s)
J Pedulla, James E. Potzick, Richard M. Silver
The National Institute of Standards and Technology (NIST) is currently developing a photomask linewidth standard (SRM 2059) with a lower expected uncertainty of calibration than the previous NIST standards (SRMs 473, 475, 476). In calibrating these

Uncertainties in Small-Angle Measurement Systems Used to Calibrate Angle Artifacts

May 1, 2004
Author(s)
Jack A. Stone Jr., M Amer, Bryon S. Faust, Jay H. Zimmerman
We have studied a number of effects that can give rise to errors in small-angle measurement systems when they are used to calibrate artifacts such as optical polygons. Of these sources of uncertainty, the most difficult to quantify are errors associated

Photomask Critical Dimension Metrology in the Scanning Electron Microscope

April 7, 2004
Author(s)
Michael T. Postek
Critical Dimension (CD) control begins at the photomask. Therefore, photomask metrology is a principal enabler for the development and manufacture of current and future generations of semiconductor devices. With the potential of 100, 65 and 45 nanometer

Techniques for Measurements in Concentrated Systems

February 1, 2004
Author(s)
Vincent A. Hackley
Concentrated suspensions present a number of technical challenges for characterization and monitoring of the solid phase. Recent developments have provided the means to analyze many concentrated systems directly or at solids loadings more closely

A Multiscale Fabrication Approach to Microfluidic System Development

January 1, 2004
Author(s)
Tony L. Schmitz, John A. Dagata, Brian S. Dutterer, W G. Sawyer
Microfluidic systems for analytical, medical, and sensing applications integrate optical or electrical readouts in low-cost, low-volume consumption systems. Embedding chemically functionalized templates with nanoscale topography within these devices links

Atomic-Resolution Measurements With a New Tunable Diode Laser-Based Interferometer

January 1, 2004
Author(s)
Richard M. Silver, H Zou, S Gonda, Bradley N. Damazo, Jay S. Jun, Carsten P. Jensen, Lowell P. Howard
We have developed a new implementation of a Michelson interferometer which has demonstrated better than 20 picometer resolution measurement capability. This new method uses a tunable diode laser as the light source with the laser wavelength continuously

Initial Measurement Results for 20 NIST RM 8240 Standard Bullets

January 1, 2004
Author(s)
Li Ma, Jun-Feng Song, Eric P. Whitenton, Theodore V. Vorburger, J Zhou, A Zheng
The SRM (Standard Reference Material) 2460 standard bullets are developed at the National Institute of Standards and Technology (NIST) to support the National Integrated Ballistics Information Network (NIBIN), recently established by the Bureau of Alcohol

Initial Measurement Results for 40 NIST RM 8240 Standard Bullets

January 1, 2004
Author(s)
Jun-Feng Song, Eric P. Whitenton, Li Ma, Theodore V. Vorburger, A Zheng
The RM (Reference Material) 8240 standard bullets are developed at the National Institute of Standards and Technology (NIST) to support the National Integrated Ballistics Information Network (NIBIN), recently established by the Bureau of Alcohol, Tobacco
Displaying 1976 - 2000 of 2724
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