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Displaying 1951 - 1975 of 4226

Traceable Calibration of a Critical Dimension Atomic Force Microscope

June 6, 2011
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, Craig D. McGray, Jon C. Geist
The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this effort is a custom in-house metrology AFM, called the calibrated AFM (C-AFM). The NIST C-AFM

Scanning the Issue Smart Grid: The Electric Energy System of the Future

June 1, 2011
Author(s)
Hamid Gharavi
This is an editorial article for a special issue on smart grid. The main objective is to report on some, if not all, of smart grid future technical challenges. While acknowledging its limited coverage, this issue offers a wide range of interesting

Ontological Behavior Modeling

May 20, 2011
Author(s)
Conrad E. Bock, James Odell
This article gives an example of improving the effectiveness of behavior modeling languages using ontological techniques. The techniques are applied to behaviors in the Unified Modeling Language (UML), using the logical meanings for classification

Simulation and Analysis for Sustainability in Manufacturing Processes

May 11, 2011
Author(s)
Mahesh Mani, Kevin W. Lyons, Alexander P. Muroyama, Bjorn J. Johansson
Sustainability has become a ubiquitous term in almost every field, especially in engineering design and manufacturing. Recently, an increased awareness of environmental problems and resource depletion has led to an emphasis on environmentally friendly

SUSTAINABLE MANUFACTURING INDICATOR REPOSITORY

May 2, 2011
Author(s)
Shaw C. Feng, Prabir Sarkar, Che B. Joung, John Carrell
Sustainable manufacturing promotes manufacturing processes that minimize environmental and social impacts while maintaining economic benefits. To achieve this, manufacturers seek metrics and measurement methods to enable them to track the progress and

Agile Test Framework for Business-to-Business Interoperability

April 12, 2011
Author(s)
Jungyub Woo, Nenad Ivezic, H Cho
Business-to-business (B2B) applications are tested routinely for conformance and interoperability against a set of data exchange standards before deployment. However, the existence of many data exchange standards, planned utilizations, deployment

Lithography, Metrology and Nanomanufacturing

April 12, 2011
Author(s)
James A. Liddle, Gregg M. Gallatin
Semiconductor chip manufacturing is by far the predominant nanomanufacturing technology in the world today. Top-down lithography techniques are used for fabrication of logic and memory chips since, in order to function, these chips must essentially be
Displaying 1951 - 1975 of 4226
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