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Search Publications

NIST Authors in Bold

Displaying 1501 - 1525 of 2174

Scanning Electron Microscope Dimensional Metrology using a Model-based Library

January 1, 2005
Author(s)
John S. Villarrubia, Andras Vladar, Michael T. Postek
The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are smaller

The Influence of Defects on the Morphology of Si (111) Etched in NHF

January 1, 2005
Author(s)
Hui Zhou, Joseph Fu, Richard M. Silver
We have implemented a kinetic Monte-Carlo (KMC) simulation to study the morphologies of Si (111) surfaces etched in NHF. Although our initial simulations reproduced the previous results from Hines, it failed to produce the morphologies observed in our

STEP, XML, and UML: Complementary Technologies

December 15, 2004
Author(s)
Russell S. Peak, Joshua Lubell, Vijay Srinivasan, Stephen C. Waterbury
One important aspect of product lifecycle management (PLM)is the computer-sensible representation of product information. Over the past 15 years or so, several languages and technologies have emerged that vary in their emphasis and applicability for such

Internet-Based Surface Metrology Algorithm Testing System

December 1, 2004
Author(s)
Son H. Bui, Thomas B. Renegar, Theodore V. Vorburger, Jayaraman Raja, Mark C. Malburg
This paper presents the development of an Internet-based surface metrology algorithm testing system. The system includes peer-reviewed surface analysis tools and a surface texture specimen database for parameter evaluation and algorithm verification. The

Traceable Pico-Meter Level Step Height Metrology

December 1, 2004
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson, Joseph Fu, Theodore V. Vorburger
The atomic force microscope (AFM) increasingly being used as a metrology tool in the semiconductor industry where the features measured are at the nanometer level and continue to decrease. Usually the height sensors of the AFM are calibrated using step

NNI Workshop Instrumentation and Metrology for Nanotechnology

November 1, 2004
Author(s)
Michael T. Postek, J J. Pellegrino
The NNI Interagency Workshop on Instrumentation and Metrology for Nanotechnology Grand Challenges was held on January 27-29, 2004 in Gaithersburg, Maryland, and was cosponsored by the National Institute of Standards and Technology (NIST), an agency of the

UML 2 Composition Model

October 1, 2004
Author(s)
Conrad E. Bock
The composition model in the Unified Modeling Language, version 2, is a major upgrade to the familiar black diamond composition of earlier versions. It supports connections between parts at the same level of decomposition, in addition to the usual part

Virtual Surface Calibration and Computational Uncertainty

October 1, 2004
Author(s)
Son H. Bui, Theodore V. Vorburger, Thomas B. Renegar
This paper presents the development of a virtual surface calibration database for parameter evaluation and algorithm verification. The database runs from a web site at the National Institute of Standards and Technology (NIST), USA. Companies, universities

NIST's Logistics Integration Solutions

September 1, 2004
Author(s)
Sharon J. Kemmerer
The NIST Manufacturing Interoperability Program staff has years of experience developing standards, validating solutions, and providing interoperability results in the field of manufacturing. Building on this experience, NIST can: (1) Work with industry to

Refractometry Using a Helium Standard

July 1, 2004
Author(s)
Jack A. Stone Jr., Alois Stejskal
The refractive index of helium at atmospheric pressure can be calculated from first principles with a very low uncertainty, on the order of 10^-10. Furthermore, the low refractive index of helium puts minimal demands on the pressure and temperature

Test of CD-SEM Shape-Sensitive Linewidth Measurement

July 1, 2004
Author(s)
John S. Villarrubia, Andras Vladar, Michael T. Postek
In a model-based library (MBL) approach to scanning electron microscope (SEM) linewidth measurement, a library of simulation results for a range of lineshapes is searched for a match to the measured image of the unknown line. Compared to standard

Gas Flowmeter Calibrations with the 34 L and 677 L PVTt Standards

June 23, 2004
Author(s)
John D. Wright, Aaron N. Johnson, Michael R. Moldover, Gina M. Kline
This document provides a description of the 34 L and 677 L pressure, volume, temperature, and time (PVTt) primary gas flow standards operated by the National Institute of Standards and Technology (NIST) Fluid Flow Group. These facilities are used to

Active Vibration Isolation for a Long-Range Scanning Tunneling Microscope

June 1, 2004
Author(s)
K J. Lan, J Y. Yen, John A. Kramar
Vibration Isolation or control is critical for the optimum operation of the Molecular Measuring Machine (M3), a high-resolution, length-metrology instrument at the National Institute of Standards and Technology. This paper describes the extension of the M3
Displaying 1501 - 1525 of 2174
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