NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Search Publications

NIST Authors in Bold

Displaying 55001 - 55025 of 73697

Validation of Standards Interfaces for Machine Control

May 27, 1996
Author(s)
Frederick M. Proctor, John L. Michaloski, William P. Shackleford, Sandor S. Szabo
Open architecture controllers offer a multitude of benefits to users of machine tools, robots, and coordinate measuring machines, ultimately reducing the life-cycle costs of installing, operating, and maintaining manufacturing equipment. Aside from those

Polymer Combustion and New Flame Retardants

May 20, 1996
Author(s)
Takashi Kashiwagi, Anthony P. Hamins, Kenneth D. Steckler, Jeffrey W. Gilman
The combustion of polymers is a complex coupled process characterized by energy feedback from a flame to the polymer surface and subsequent gasification of the polymer to generate combustible degradation products. Energy feedback characteristics for two

New Silyl Derivatives for the Determination of Alcohols by GC/MS

May 12, 1996
Author(s)
Vladimir G. Zaikin, Michael Y. Shmatko, Anzor I. Mikaia
1-Methyl-1-silacyclobutyl, 1-Methyl-1-silacyclopentyl, pentamethyldisilaethyl and pentamethyl-1,3- disilapropyl derivatives for alcohols are obtained, and characteristic peaks in their mass spectra are revealed. The use of specific silyl derivatives for

Ab Initio Calculations and Kinetic Modeling of Halon and Halon Replacements

May 7, 1996
Author(s)
H. L. Paige, R J. Berry, M Schwartz, P Marshall, D R. Burgess, Marc R. Nyden
The mode of action of the chemical-acting flame suppression agents such as the halons is generally, though not universally, accepted. The details of the several reactions involved in chemical suppression have been studied by many groups using experimental

SCATMECH: Polarized Light Scattering C++ Class Library (Version 3.00)

May 6, 1996
Author(s)
Thomas A. Germer
A C++ object class library has been developed to distribute bidirectional reflectance distribution function (BRDF) models for light scattering from surfaces. Emphasis has been given to those models which are physically-based and which predict the

Calibration of Scanning Electron Microscope Magnification Standards SRM-484

May 1, 1996
Author(s)
Joseph Fu, Theodore V. Vorburger, D Ballard
Standard Reference Material (SRM) 484 is an artifact for calibrating the magnification scale of a scanning electron microscope. Since 1977 the National Institute of Standards and Technology (NIST) has produced seven issues of SRM484 amounting to

Controlling Activities in a Virtual Manufacturing Cell

May 1, 1996
Author(s)
Michael Iuliano, Albert W. Jones
Researchers at the National Institute of Standards and Technology are developing a virtual manufacturing cell. This cell will contain simulation models of a wide range of manufacturing equipment, processes, and systems. It will have commercial and

Electrical Test Structures Replicated in Silicon-On-Insulator Material

May 1, 1996
Author(s)
Michael W. Cresswell, J Sniegowski, Rathindra Ghoshtagore, Robert Allen, L Linholm, John S. Villarrubia
Measurements of the linewidths of submicrometer features made by different metrology techniques have frequently been characterized by differences of up to 90 nm. The purpose of the work reported here is to address the special difficulties that this

High Accuracy Overlay Measurements

May 1, 1996
Author(s)
Richard M. Silver, James E. Potzick, Fredric Scire, Robert D. Larrabee
The reduced critical dimensions of semiconductor devices place more stringent requirements on the precision and accuracy of overlay metrology tools used to monitor stepper feature placement. The use of mix and match stepper techniques and step and scan

High-Accuracy Critical-Dimension Metrology Using a Scanning Electron Microscope

May 1, 1996
Author(s)
J R. Lowney, Andras Vladar, Michael T. Postek
Two Monte Carlo computer codes have been written to simulate the transmitted-, backscattered-, and secondary-electron signals from targets in a scanning electron microscope. The first discussed, MONSEL-II, is applied to semi-infinite lines produced

Job Shop Scheduling

May 1, 1996
Author(s)
Albert T. Jones, Luis C. Rabelo, Yuehwern Yih
A large number of approaches to the modeling and solution of job shop scheduling problems have been reported in the OR literature, with varying degrees of success. These approaches revolve around a series of technological advances that have occurred over
Displaying 55001 - 55025 of 73697
Was this page helpful?