Suehle, J.
and Chaparala, P.
(1996),
Characterization of Time-Dependent Dielectric Breakdown in Intrinsic Thin SiO<sub>2</sub>, Microelectronics Journal
(Accessed May 6, 2024)
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Characterization of Time-Dependent Dielectric Breakdown in Intrinsic Thin SiO2
Published
Author(s)
, P Chaparala
Citation
Microelectronics Journal
Volume
27
Pub Type
Journals
Citation
Created December 30, 1996, Updated October 12, 2021