Suehle, J.
and Chaparala, P.
(1996),
Characterization of Time-Dependent Dielectric Breakdown in Intrinsic Thin SiO<sub>2</sub>, Microelectronics Journal
(Accessed May 9, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Characterization of Time-Dependent Dielectric Breakdown in Intrinsic Thin SiO2
Published
Author(s)
, P Chaparala
Citation
Microelectronics Journal
Volume
27
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 30, 1996, Updated October 12, 2021