Martin, A.
, Suehle, J.
, Chaparala, P.
, O'Sullivan, P.
, Mathewson, A.
and Messick, C.
(1996),
Assessing MOS Gate Oxide Reliability on Wafer Level with Ramped/Constant Voltage and Current Stress, 1995 IEEE International Integrated Reliability Workshop Final Report, Lake Tahoe, CA, USA
(Accessed December 14, 2024)
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Assessing MOS Gate Oxide Reliability on Wafer Level with Ramped/Constant Voltage and Current Stress
Published
Author(s)
A. Martin, , P Chaparala, P. O'Sullivan, A. Mathewson, C. Messick
Proceedings Title
1995 IEEE International Integrated Reliability Workshop Final Report
Conference Dates
October 22-25, 1995
Conference Location
Lake Tahoe, CA, USA
Pub Type
Conferences
Citation
Issues
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Created December 30, 1996, Updated October 12, 2021