Chaparala, P.
, Suehle, J.
, Messick, C.
and Roush, M.
(1996),
Electric Field Dependent Dielectric Breakdown of Intrinsic SiO<sub>2</sub> Films Under Dynamic Stress, Proc., 34th Annual IEEE International Reliability Physics Symposium, Dallas, TX, USA
(Accessed July 26, 2024)
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Electric Field Dependent Dielectric Breakdown of Intrinsic SiO2 Films Under Dynamic Stress
Published
Author(s)
P Chaparala, , C. Messick, M. Roush
Proceedings Title
Proc., 34th Annual IEEE International Reliability Physics Symposium
Conference Dates
April 30-May 2, 1996
Conference Location
Dallas, TX, USA
Pub Type
Conferences
Citation
Issues
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Created December 30, 1996, Updated October 12, 2021