@conference{765521, author = {P Chaparala and John Suehle and C. Messick and M. Roush}, title = {Electric Field Dependent Dielectric Breakdown of Intrinsic SiO2 Films Under Dynamic Stress}, year = {1996}, month = {1996-12-31 00:12:00}, publisher = {Proc., 34th Annual IEEE International Reliability Physics Symposium, Dallas, TX, USA}, language = {en}, }