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Metrology

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Displaying 2176 - 2200 of 2718

A Careful Consideration of the Calibration Concept

January 1, 2001
Author(s)
Steven D. Phillips, William T. Estler, Theodore D. Doiron, K Eberhardt, M. Levenson
This paper is a detailed discussion of the technical aspects of the calibration process with emphasis on the definition of the measurand, the conditions under which the calibration results are valid, and the subsequent use of the calibration results in

A Novel Artifact for Testing Large Coordinate Measuring Machines

January 1, 2001
Author(s)
Steven D. Phillips, Daniel S. Sawyer, Bruce R. Borchardt, D E. Ward, D E. Beutel
We present a high accuracy artifact useful for the evaluation of large CMMs. This artifact can be physically probed by the CMM in contrast to conventional techniques that use purely optical methods such as laser interferometers. The system can be used over

Atomic Level Surface Metrology

January 1, 2001
Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Jun-Feng Song, Thomas Brian Renegar, Joseph Fu, Ndubuisi George Orji, V W. Tsai, E. C. Williams, H Edwards, D Cook, P West, R Nyffenegger
MotivationSemiconductor wafers and many types of optical elementsrequire ultra-smooth surfaces in order to functionas specifiedExamples:Laser gyro mirrors with rms roughness 0.1 nmSilicon gate oxides with thickness 3 nm,rms roughness must be significantly

Chapter 12: Analysis of Individual Collected Particles

January 1, 2001
Author(s)
Robert A. Fletcher, John A. Small, J H. Scott
This chapter describes microscopes and microprobes used for analysis of collected, individual particles. The instruments discussed are the light microscope, electron microscopes (scanning, environmental and transmission), electron microprobes, laser

Effect of Aluminum Flake Orientation on Coating Appearance

January 1, 2001
Author(s)
L Sung, Maria Nadal, M E. McKnight, Egon Marx, R Dutruc, B Laurenti
The orientation of platelet-like pigments in coatings is affected by the processing conditions resulting in appearance variations of the final product. A set of aluminum-flake pigmented coatings having different flake orientations was pre-pared using

Establishment of a Virtual / Physical Standard for Bullet Signature Measurements

January 1, 2001
Author(s)
Jun-Feng Song, Theodore V. Vorburger, M Ols
The National Integrated Ballistics Information Network (NIBIN) is currently under development by the Bureau of Alcohol, Tobacco and Firearms (ATF) and the Federal Bureau of Investigation (FBI). The National Institute of Standards and Technology (NIST) and

Establishment of a Virtual/Physical Standard for Bullet Signature Measurements

January 1, 2001
Author(s)
Jun-Feng Song, Theodore V. Vorburger, M Ols
The National Integrated Ballistics Information Network (NIBIN) is currently under development by the Bureau of Alcohol, Tobacco and Firearms (ATF) and the Federal Bureau of Investigation (FBI). The National Institute of Standards and TEchnology (NIST) and

Establishment of Measurement Traceability for NIST Standard Bullets and Casings

January 1, 2001
Author(s)
Jun-Feng Song, Theodore V. Vorburger, M Ols
The National Integrated Ballistics Information Network (NIBIN) is currently under development by the Bureau of Alcohol, Tobacco and Firearms (ATF) and the Federal Bureau of Investigation (FBI). The NIST Standard Bullets and Casings Project aims to provide

Future Voltage Metrology at NIST

January 1, 2001
Author(s)
Yi-hua D. Tang, June E. Sims, Michael H. Kelley
Presently NIST uses a voltage calibration path to maintain the U.S. legal volt and provide for the dissemination of an internationally consistent, accurate, reproducible and traceable voltage standard, tied to the SI units. Potential improvements and

Kinematic Modeling and Analysis of a Planar Micro-Positioner

January 1, 2001
Author(s)
Nicholas G. Dagalakis, John A. Kramar, E Amatucci, Robert Bunch
The static and dynamic performance of a control system depends on the accuracy of the mathematical model of the plant that is being controlled. In this work, the accuracies of a linear and a second-order kinematic model were evaluated for a two-dimensional

Length and Dimensional Measurement at NIST

January 1, 2001
Author(s)
Dennis A. Swyt
This paper reports on the past, present, and future of length and dimensional measurements at NIST. It covers the evolution of the SI unit of length through its three definitions and the evolution of NBS-NIST dimensional measurement from early linescales

Modeling, Simulation and Prediction of Rockwell Hardness Indentation

January 1, 2001
Author(s)
Li Ma, J Zhou, Theodore V. Vorburger, R Dewit, Richard J. Fields, Samuel Low, Jun-Feng Song
Rockwell hardness test, as a measure of the resistance of a material to localized plastic deformation, is a valuable and widely used mechanical test. However, the accuracy of Rockwell hardness measurement is still in question. The indenter, including both

Molecular Measuring Machine Design and Performance

January 1, 2001
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Vincent P. Scheuerman, Fredric Scire, E C. Teague
We have developed a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing two-dimensional point-to-point measurements with nanometer-level uncertainties over a 50 mm by 50 mm area. The scanning tunneling microscope

Neolithography Consortium: A Progress Report

January 1, 2001
Author(s)
James E. Potzick
The role of process simulation is becoming an increasingly important part of microlithography process control and photomask metrology as wafer feature sizes become smaller than the exposure wavelength, because the pattern transfer from photomask to wafer

NIST Centenial Sessions August Second Two Thousand and One

January 1, 2001
Author(s)
W Anderson, Dennis A. Swyt, H Semerjian
The National Conference of Standards Laboratories International was formed in forty years ago (as NCSL) to promote cooperative efforts for solving the common problems faced by measurement laboratories. The principal driver for its establishment was the

NIST/SEMATECH Collaboration: Application of Nano-Tips to Production CD-SEMs

January 1, 2001
Author(s)
Andras Vladar, Michael T. Postek
This is the final report of a two-part study about the application of nano-tips to critical dimension (CD) scanning electron microscope (SEMs) used in integrated circuit production. Nano-tips are essentially very sharp electron emitter tips that offer an

Overlay Metrology: Recent Advances and Future Solutions

January 1, 2001
Author(s)
Richard M. Silver, Jay S. Jun, S Fox, Edward A. Kornegay
As devices shrink and clock speeds continue to increase, process control and measurement of I critical dimension linewidths and the essential overlay of features from different photolithographic levels become increasingly important. Improved manufacturing
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