U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Search Publications by: Steven Grantham (Fed)

Search Title, Abstract, Conference, Citation, Keyword or Author
Displaying 51 - 75 of 132

Measuring Pulse Energy With Solid-State Photodiodes

April 10, 2009
Author(s)
Robert E. Vest, Shannon B. Hill, Steven E. Grantham
With the advent of extreme ultraviolet lithography (EUVL) the measurement of the energy contained in pulses of short-wavelength radiation is becoming increasingly important. Even low average power sources can deliver pulses of radiation with high peak

EUVL dosimetry at NIST

March 13, 2009
Author(s)
Charles S. Tarrio, Steven E. Grantham, Marc J. Cangemi, Robert E. Vest, Thomas B. Lucatorto, Noreen Harned
As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three extreme

A Low Cost Fiducial Reference for Computed Tomography

November 11, 2008
Author(s)
Zachary H. Levine, Steven Grantham, Daniel S. Sawyer, Anthony P. Reeves, David F. Yankelevitz
Rationale and Objectives. To detect the growth in lesions, it is necessary to ensure that the apparent changes in size are above the noise floor of the system. By introducing a fiducial reference, it may be possible to detect smaller changes in lesion size

Quantitative Measurement of Outgas Products From EUV Photoresists

March 14, 2008
Author(s)
Charles S. Tarrio, Bruce A. Benner Jr, Robert E. Vest, Steven E. Grantham, Shannon B. Hill, Thomas B. Lucatorto, Jay H. Hendricks, Patrick J. Abbott, Greg Denbeaux, Alin Antohe, Chimaobi Mbanaso, Kevin Orbek
The photon-stimulated emission of organic molecules from the photoresist during exposure is a serious problem for extreme- ultraviolet lithography (EUVL) because the adsorption of the outgassing products on the EUV optics can lead to carbonization and

Multilayers for Next Generation X-Ray Sources

December 1, 2007
Author(s)
Sasa Bajt, H N. Chapman, E Spiller, S Hau-Riege, J Alameda, A J. Nelson, C C. Walton, B Kjornrattanawanich, Andrew Aquila, Charles Tarrio, Steven Grantham
Multilayers are artificially layered structures that can be used to create optics and optical elements for a broad range of x-ray wavelengths, or can be optimized for other applications. The development of next generation x-ray sources (synchrotrons and x

Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography

September 1, 2006
Author(s)
M Nieto, J P. Allain, V Titov, M R. Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles Tarrio, Yaniv Barad, Steven Grantham, Thomas B. Lucatorto, Bryan Rice
The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To study