March 17, 2014
Author(s)
Wei Li, Christina A. Hacker, Guangjun Cheng, Angela R. Hight Walker, Curt A. Richter, David J. Gundlach, Yiran Liang, boyuan Tian, Xuelei Liang, Lianmao Peng
Resist residue from the device fabrication process is a significant source of contamination at the metal/graphene contact interface. Ultraviolet Ozone (UVO) treatment is proven here, by X-ray photoelectron spectroscopy (XPS) and Raman measurement, to be an