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UV/Ozone treatment to reduce metal-graphene contact resistance

Published

Author(s)

Wei Li, Kurt Pernstich, Angela R. Hight Walker, Tian T. Shen, Guangjun Cheng, Christina A. Hacker, Curt A. Richter, Qiliang Li, David J. Gundlach, Xuelei Liang, Lianmao Peng, Yiran Liang
Citation
Applied Physics Letters

Citation

Li, W. , Pernstich, K. , Hight, A. , Shen, T. , Cheng, G. , Hacker, C. , Richter, C. , Li, Q. , Gundlach, D. , Liang, X. , Peng, L. and Liang, Y. (2013), UV/Ozone treatment to reduce metal-graphene contact resistance, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=912639 (Accessed April 21, 2024)
Created May 8, 2013, Updated February 19, 2017