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PUBLICATIONS

UV/Ozone treatment to reduce metal-graphene contact resistance

Published

Author(s)

Wei Li, Kurt Pernstich, Angela R. Hight Walker, Tian T. Shen, Guangjun Cheng, Christina A. Hacker, Curt A. Richter, Qiliang Li, David J. Gundlach, Xuelei Liang, Lianmao Peng, Yiran Liang
Citation
Applied Physics Letters
Pub Type
Journals

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Semiconductors

Citation

Li, W. , Pernstich, K. , Hight, A. , Shen, T. , Cheng, G. , Hacker, C. , Richter, C. , Li, Q. , Gundlach, D. , Liang, X. , Peng, L. and Liang, Y. (2013), UV/Ozone treatment to reduce metal-graphene contact resistance, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=912639 (Accessed May 1, 2024)

Created May 8, 2013, Updated February 19, 2017