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UV/Ozone treatment to reduce metal-graphene contact resistance



Wei Li, Kurt Pernstich, Angela R. Hight Walker, Tian T. Shen, Guangjun Cheng, Christina A. Hacker, Curt A. Richter, Qiliang Li, David J. Gundlach, Xuelei Liang, Lianmao Peng, Yiran Liang
Applied Physics Letters


Li, W. , Pernstich, K. , Hight, A. , Shen, T. , Cheng, G. , Hacker, C. , Richter, C. , Li, Q. , Gundlach, D. , Liang, X. , Peng, L. and Liang, Y. (2013), UV/Ozone treatment to reduce metal-graphene contact resistance, Applied Physics Letters, [online], (Accessed April 21, 2024)
Created May 8, 2013, Updated February 19, 2017