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Search Publications by: Wen-Li Wu (Assoc)

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Displaying 26 - 50 of 193

Characterization of the Photoacid Diffusion Length

February 27, 2009
Author(s)
Shuhui Kang, Vivek Prabhu, Wen-Li Wu, Eric K. Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh
The photoacid diffusion length is a critical issue for EUV photoresists and photolithography because it governs critical dimension (CD), line-edge-roughness (LER) and line-width-roughness (LWR). This paper provides an approach to characterize the photoacid

Investigation of N 2 Plasma Effects on the Depth Profile of Hydrogen Silsesquioxane Thin Films Using High Resolution Specular X-Ray Reflectivity

October 16, 2008
Author(s)
Hae-Jeong Lee, Eric K. Lin, J K. Lan, Y L. Cheng, H C. Liou, Wen-Li Wu, Y L. Wang, M S. Feng, C G. Chao
Non-destructive, specular X-ray reflectivity (SXR) measurements were used to investigate N2 plasma effects on the density depth profile of hydrogen silsesquioxane (HSQ) thin films. The SXR data indicate that the density profile of an HSQ film without

Neutron Reflectivity for Interfacial Materials Characterization

October 16, 2008
Author(s)
Eric K. Lin, D J. Pochan, R Kolb, Wen-Li Wu, Sushil K. Satija
Measurements of the physical properties of materials, such as the coefficient of thermal expansion (CTE), in thin films and at interfaces are very important in microelectronics packaging and interconnection, especially as electronic devices decrease in

A Molecular Model for Toughening in Double-Network Hydrogels

June 18, 2008
Author(s)
Vijay Tirumala, Sanghun Lee, Taiki Tominaga, Eric K. Lin, Jian P. Gong, Paul D. Butler, Wen-Li Wu
A molecular mechanism is proposed for the toughness enhancement observed in double network (DN) hydrogels prepared from poly (2 acrylamido, 2-methyl, 1-propanesulfonicacid) (PAMPS) polyelectrolyte network and polyacrylamide (PAAm) linear polymer. It is an

Characterizing Pattern Structures Using X-Ray Reflectivity

March 28, 2008
Author(s)
Hae-Jeong Lee, Christopher L. Soles, Hyun Wook Ro, Shuhui Kang, Eric K. Lin, Alamgir Karim, Wen-Li Wu
Specular X-ray reflectivity (SXR) can be used, in the limit of the effective medium approximation (EMA), as a high-resolution shape metrology for periodic patterns on a planar substrate. The EMA means that the density of the solid pattern and the space

Line Width Roughness and Cross Sectional Measurements of Sub-50 nm Structures with CD-SAXS and CD-SEM

March 24, 2008
Author(s)
Chengqing C. Wang, Ronald L. Jones, Kwang-Woo Choi, Christopher L. Soles, Eric K. Lin, Wen-Li Wu, James S. Clarke, John S. Villarrubia, Benjamin Bunday
Critical dimension small angle x-ray scattering (CD-SAXS) is a measurement platform which is capable of measuring the average cross section and sidewall roughness in patterns ranging from (10 to 500) nm in pitch with sub nm precision. These capabilities

Structure and Dynamics in Multicomponent Polyelectrolyte Solutions

March 11, 2008
Author(s)
Sanghun Lee, Vijay Tirumala, Michihiro Nagao, Taiki Tominaga, Eric K. Lin, Jian P. Gong, Wen-Li Wu
Double-network hydrogels (DN-gels) prepared from the combination of a moderately crosslinked anionic polyelectrolyte (poly(2-acrylamido-2-methyl-1-propanesulfonic acid, PAMPS) and an uncrosslinked linear polymer (polyacrylamide, PAAm) solution show strong

Thermodynamic Interactions in Double-Network Hydrogels

March 11, 2008
Author(s)
Taiki Tominaga, Vijay Tirumala, Sanghun Lee, Eric K. Lin, Jian P. Gong, Wen-Li Wu
Double-network hydrogels (DN-gels) prepared from the combination of a moderately crosslinked anionic polyelectrolyte and an uncrosslinked linear polymer solution exhibit mechanical properties such as fracture toughness that are intriguingly superior to

Characterization of the Latent Image to Developed Image in Model EUV Photoresists

February 22, 2008
Author(s)
John T. Woodward IV, Kwang-Woo Choi, Vivek Prabhu, Shuhui Kang, Kristopher Lavery, Wen-Li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher K. Ober
Current extreme ultraviolet (EUV) photoresist materials do not yet meet exposure-dose sensitivity, line-width roughness, and resolution requirements. In order to quantify how trade-offs are related to the materials properties of the resist and processing

The Molecular Origin of Enhanced Toughness in Double-Network Hydrogels

October 22, 2007
Author(s)
Taiki Tominaga, Vijay Tirumala, Eric K. Lin, Jian P. Gong, Hidemitsu Furukawa, Yoshihito Osada, Wen-Li Wu
The long-standing pursuit of a synthetic equivalent to tissue cartilage has seen significant new activity with the development of a new materials strategy: double-network hydrogels (DN-gels) prepared from a combination of an anionic polyelectrolyte and a

Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist

February 25, 2007
Author(s)
Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric K. Lin, Wen-Li Wu, John T. Woodward IV, Michael Leeson, H Cao, Manish Chandhok, George Thompson
Current extreme ultraviolet (EUV) photoresist materials do not yet meet requirements on exposure-dose sensitivity, line-width roughness (LWR), and resolution. Fundamental studies are required to quantify the trade-offs in materials properties and

Evaluation of the 3D Compositional Fluctuation Effect on Line-Edge-Roughness

February 25, 2007
Author(s)
Shuhui Kang, Wen-Li Wu, B D. Vogt, Vivek Prabhu, Eric K. Lin, Karen Turnquest
Line-edge-roughness (LER) and the relationship to resist processing and materials design is a critical problem for sub-65 nm photolithography. In this work we investigate how chemical composition fluctuations (heterogeneity) produced by the reaction

FTIR measurements of compositional heterogeneities

February 25, 2007
Author(s)
Shuhui Kang, B D. Vogt, Wen-Li Wu, Vivek Prabhu, David L. VanderHart, Ashwin Rao, Eric K. Lin, Karen Turnquest
A general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy has been demonstrated Polymer films with varying degrees of heterogeneity were prepared using a model chemically

Identifying Materials Limits of Chemically Amplified Photoresists

February 25, 2007
Author(s)
Wen-Li Wu, Vivek Prabhu, Eric K. Lin
Chemically amplified photoresists are likely to remain the primary imaging materials for the semiconductor industry. As feature sizes decrease to dimensions comparable to the characteristic size of the molecules in the photoresist, a significant challenge

Characterization of Compositional Heterogeneity in Chemically Amplified Photoresist Polymer Thin Films with Infrared Spectroscopy

February 9, 2007
Author(s)
Shuhui Kang, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, David L. VanderHart, Ashwin Rao, Karen Turnquest
We demonstrate a general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy. Polymer films with varying degrees of heterogeneity were prepared using a model chemically amplified