Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Surface Directed Crystallization and Autophobic Dewetting in Semicrystalline Polymer Thin Films

Published

Author(s)

D J. Pochan, Eric K. Lin, Wen-Li Wu

Abstract

Significant crystallization is observed via atomic force microscopy and x-ray diffraction in spin-cast polymer thin films with thickness ranging from 5 microns to 80 nm. Neutron reflectivity also reveals significant crystallinity in the polymer directly neighboring a silicon substrate. Autophobic dewetting occurs upon heating above the polymer bulk melting temperature revealing a persistent polymer/SiOx interfacial layer. The polymer sublayer is stable despite the lack of specific interactions between polymer segments and the silicon substrate.
Citation
Physical Review Letters

Keywords

atomic force microscopy, dewetting, polymer crystallization, polymer thin film, polymer/solid interface, x-ray reflectivity, x-ray scattering

Citation

Pochan, D. , Lin, E. and Wu, W. (2008), Surface Directed Crystallization and Autophobic Dewetting in Semicrystalline Polymer Thin Films, Physical Review Letters (Accessed May 2, 2024)
Created October 16, 2008