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Displaying 1 - 25 of 34

Uncertainties in Electron Probe Microanalysis

March 12, 2010
Author(s)
Ryna B. Marinenko, Stefan D. Leigh
This tutorial discusses the importance of citing valid uncertainties when reporting analytical results and the need for a universally accepted approach for evaluating uncertainties. Today, the CIPM procedure has been accepted by numerous international

Characterization of SiGe Films for use as a National Institute of Standards and Technology (NIST) Microanalysis Reference material (RM 8905)

February 1, 2010
Author(s)
Ryna B. Marinenko, Shirley Turner, David S. Simons, Savelas A. Rabb, Rolf L. Zeisler, Lee L. Yu, Dale E. Newbury, Rick L. Paul, Nicholas W. Ritchie, Stefan D. Leigh, Michael R. Winchester, Lee J. Richter, Douglas C. Meier, Keana C. Scott, D Klinedinst, John A. Small
Bulk SiGe wafers cut from single-crystal boules and two SiGe thick films (4 m and 5 m thick) on Si wafers were evaluated with the electron probe microanalyzer for the extent of heterogeneity and composition for use as reference materials needed by the

Electron Microprobe Characterization of Si-Ge Alloys and Films for Use as Microanalysis Reference Materials

October 16, 2008
Author(s)
Ryna B. Marinenko, Shirley Turner, Dale E. Newbury, Robert L. Myklebust, Lee L. Yu, Rolf L. Zeisler, David S. Simons, John A. Small
Bulk SiGe wafers cut from single-crystal boules and SiGe thick films on Si wafers were evaluated with the electron probe microanalyzer for the extent of heterogeneity and composition for use as reference standards needed by the microelectronics industry in

Characterization of SiGe Bulk Compositional Standards with Electron Probe Microanalysis

September 1, 2003
Author(s)
Ryna B. Marinenko, J T. Armstrong, Shirley Turner, Eric B. Steel, F A. Stevie
Bulk SiGe wafers cut from single-crystal boules were evaluated with the electron probe microanalyzer (EPMA) for micro- and macroheterogeneity for use as primary standards for future characterization of SiGe thin films on Si that are needed by the

High-accuracy determination of the dependence of the photoluminescence emission energy on alloy composition in Al x Ga 1-x As films

April 1, 2003
Author(s)
Larry Robins, J T. Armstrong, Ryna B. Marinenko, Albert J. Paul, John Pellegrino, Kristine A. Bertness
In an effort to improve the accuracy of photoluminescence (PL) measurements of the Al mole fraction (x) of Al xGa 1-xAs alloys, the PL peak emission energy, E PL,peak, was measured at room temperature for molecular-beam epitaxy-grown Al xGa 1-xAs films

High-Accuracy Determination of the Dependence of the PhotoluminescenceEmission Energy on Alloy Composition in Al x Ga 1-x As Films

April 1, 2003
Author(s)
Lawrence H. Robins, J T. Armstrong, Ryna B. Marinenko, Albert J. Paul, J G. Pellegrino, Kristine A. Bertness
In an effort to improve the accuracy of photoluminescence (PL)spectroscopy as a composition (Al mole fraction) measurement method forthe Al xGa 1-xAs alloy system, the PL peak emission energy,E PL,peak, was measured at room temperature for a set of MBE

Compositional Homogeneity of Ferroelectric (Pb,La)(Ti,Zr)O- 3 Thick Films

February 1, 2003
Author(s)
S Bernik, Ryna B. Marinenko, J Holc, Z Samardzija, M Ceh, M Kosec
Quantified WDS x-ray element maps were used to characterize active PLZT layers on Pt/PLZT/Al 2O 3 substrates, one fired at 1050 C and the other at 1150 C. In the layer fired at 1050 C randomly distributed micrometer size compositional irregularities were

X-ray diffraction, photoluminescence and composition standards of compound semiconductors

January 1, 2003
Author(s)
Alexana Roshko, Kristine A. Bertness, J T. Armstrong, Ryna B. Marinenko, Marc L. Salit, Lawrence H. Robins, Albert J. Paul, R J. Matyi
Work is underway to develop composition standards and standardized assessment procedures for compound semiconductors. An AlGaAs composition standard with less than 2% uncertainty is being developed. The improved accuracy of this standard is being achieved

NIST Standards for Microanalysis and the Certification Process

December 1, 2002
Author(s)
Ryna B. Marinenko
Procedures for testing research materials for the determination of the extent of within-specimen heterogeneity and between-specimen heterogeneity are described. These procedures, which have been developed and used at NIST in the certification of several

Composition standards for III-V semiconductor epitaxial films

November 11, 2002
Author(s)
Kristine A. Bertness, Lawrence H. Robins, J T. Armstrong, Ryna B. Marinenko, Albert J. Paul, Marc L. Salit
A program is underway at NIST to establish standard reference materials (SRMs) for the calibration of instruments used to measure the chemical composition of epitaxially grown III-V semiconductor thin films. These SRMs are designed for the calibration of

Fabrication and Electron Microprobe Characterization of Barium-Strontium-Titanate (BST) Films

February 1, 2001
Author(s)
Ryna B. Marinenko, J T. Armstrong, Debra L. Kaiser, Joseph J. Ritter, Peter K. Schenck, C P. Bouldin, J Blendell, Igor Levin
Barium strontium titanate (BST) thin films of varying composition and thickness (5nm to 400nm) on (100)Si or Pt/(100)Si substrates were measured using an electron microprobe analyzer with wavelength dispersive x-ray spectrometers. Most of the films were

Preparation and Certification of K-411 Glass Microspheres

December 1, 2000
Author(s)
Ryna B. Marinenko, S V. Roberson, J S. Small, Barbara B. Thorne, Douglas H. Blackburn, D Kauffman, Stefan D. Leigh
The production and characterization of NBS K-411 glass microspheres in the 3-40 um range for certification as a NIST Standard Reference Material (SRM) are described. EDS quantitative analysis and heterogeneity evaluations of the microspheres were made with

AlGaAs Composition Measurements from In Situ Optical Reflectance

July 1, 2000
Author(s)
Kristine A. Bertness, J T. Armstrong, Ryna B. Marinenko, Larry Robins, Albert J. Paul, Joseph G. Pellegrino, Paul M. Amirtharaj, Deane Chandler-Horowitz
We measure the composition of AlGaAs layers during epitaxial crystal growth using in situ normal-incidence optical reflectance supported by independent methods of measuring growth rate. The results are compared with conventional ex situ characterization.

Dye Impregnation Method for Revealing Machining Crack Geometry

April 1, 2000
Author(s)
Yasumitsu Matsuo, M. Sando, L K. Ives, Ryna B. Marinenko, George D. Quinn
An observation technique for machining cracks in ceramics has been developed. Palladium (Pd) nitrate water solution was impregnated into a bending specimen using cold isostatic pressing. Following a failure test, crack geometry was determined from a Pd