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Search Publications by: William F Guthrie (Assoc)

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Displaying 76 - 100 of 192

Effect of Static Analysis Tools on Software Security: Preliminary Investigation

October 29, 2007
Author(s)
Vadim Okun, William F. Guthrie, Romain Gaucher, Paul E. Black
Static analysis tools can handle large-scale software and find thousands of defects. But do they improve software security? We evaluate the effect of static analysis tool use on software security in open source projects. We measure security by

Development of Certified Reference Materials of Ion-Implanted Dopants in Silicon for Calibration of Secondary Ion Mass Spectrometers

January 1, 2007
Author(s)
David S. Simons, Robert G. Downing, George P. Lamaze, Richard M. Lindstrom, Robert R. Greenberg, Rick L. Paul, Susannah Schiller, William F. Guthrie
Certified reference materials have been developed for calibration of the concentrations of the most common dopants used in silicon semiconductor technology boron, arsenic, and phosphorus. These materials consist of a single dopant species that is

Calcium Phosphate Cement With Non-Rigidity and Strength Durability for Periodontal Bone Repair

August 1, 2006
Author(s)
Hockin D. Xu, Shozo Takagi, Limin Sun, L A. Hussain, Laurence C. Chow, William F. Guthrie, James H. Yen
Background. The need for biomaterials to treat periodontal osseous defects has increased as the world population ages. The objective of the present study was to develop a self-hardening, resorbable, and mech/anically strong calcium phosphate cement (CPC)

Certification of SRM 114q: Part I

June 14, 2006
Author(s)
Chiara F. Ferraris, William F. Guthrie, A Aviles, Robin K. Haupt, Bruce S. MacDonald
The standard reference material (SRM) for fineness of cement, SRM 114, is an integral part of the calibration material routinely used in the cement industry to qualify cements. Being a powder, the main physical properties of cement, prior to hydration, are

Certification of SRM 114q: Part II

June 14, 2006
Author(s)
Chiara F. Ferraris, Max A. Peltz, William F. Guthrie, A Aviles, Robin K. Haupt, Bruce S. MacDonald
The standard reference material (SRM) for fineness of cement, SRM 114, is an integral part of the calibration material routinely used in the cement industry to qualify cements. Being a powder, the main physical properties of cement, prior to hydration, are

k=2 and Other Sometimes Hidden Assumptions in Chemical Measurement Uncertainty Intervals

April 24, 2006
Author(s)
David L. Duewer, S L. Ellison, William F. Guthrie, D B. Hibbert, C Jackson, A Kallner, Stefan D. Leigh, Reenie M. Parris, Kenneth W. Pratt, Michele M. Schantz, Katherine E. Sharpless
A recent interlaboratory study that required individual analysts to estimate uncertainty intervals for their results revealed that some experienced chemical analysts have difficulty with measurement uncertainty calculations. To help validate assumptions

Traceable Atomic Force Microscope Dimensional Metrology at NIST

March 1, 2006
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, Michael W. Cresswell, Richard A. Allen, William F. Guthrie
The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. There are two major instruments being used for traceable measurements at NIST. The first is a custom in-house

Nano- and Atomic-Scale Length Metrology

January 1, 2006
Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C. Feng, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Wei Chu
We discuss nano-scale length metrology of linewidth, step height, and line edge roughness (LER). These properties are of growing importance to the function and specification of semiconductor devices as the dimensions of semiconductor devices shrink to the

Critical Dimension Reference Features with Sub-Five Nanometer Uncertainty

May 30, 2005
Author(s)
Michael W. Cresswell, Ronald G. Dixson, William F. Guthrie, Richard A. Allen, Christine E. Murabito, Brandon Park, Joaquin (. Martinez, Amy Hunt
The implementation of a new type of HRTEM-imaging (High-Resolution Transmission Electron Microscopy) test structure, and the use of CD-AFM (CD-Atomic Force Microscopy) to serve as the transfer metrology have resulted in reductions in the uncertainties

Comparison of SEM and HRTEM CD-Measurements Extracted from Monocrystalline Tes-Structures Having Feature Linewidths from 40 nm to 240 nm

April 18, 2005
Author(s)
Michael W. Cresswell, Brandon Park, Richard A. Allen, William F. Guthrie, Ronald G. Dixson, Wei Tan, Christine E. Murabito
CD measurements have been extracted from SEM and HRTEM images of the same set of monocrystalline silicon features having linewidths between 40 and 200 nm. The silicon features are incorporated into a new test structure which has been designed to facilitate