Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Electrical Linewidth Test Structures Fabricated in Mono-Crystalline Films for Reference Material Applications

Published

Author(s)

Michael W. Cresswell, J. J. Sniegowski, Rathindra Ghoshtagore, Richard A. Allen, William F. Guthrie, Loren W. Linholm
Proceedings Title
Proc., IEEE International Conference on Microelectronic Test Structures
Conference Dates
March 18-20, 1997
Conference Location
Monterey, CA, USA

Citation

Cresswell, M. , Sniegowski, J. , Ghoshtagore, R. , Allen, R. , Guthrie, W. and Linholm, L. (1997), Electrical Linewidth Test Structures Fabricated in Mono-Crystalline Films for Reference Material Applications, Proc., IEEE International Conference on Microelectronic Test Structures, Monterey, CA, USA (Accessed December 14, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 30, 1997, Updated October 12, 2021