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Recent Developments in Electrical Linewidth and Overlay Metrology for Integrated Circuit Fabrication Processes

Published

Author(s)

Michael W. Cresswell, J. J. Sniegowski, Rathindra Ghoshtagore, Richard A. Allen, William F. Guthrie, A. W. Gurnell, Loren W. Linholm, E C. Teague
Citation
Japanese Journal of Applied Physics
Volume
35

Citation

Cresswell, M. , Sniegowski, J. , Ghoshtagore, R. , Allen, R. , Guthrie, W. , Gurnell, A. , Linholm, L. and Teague, E. (1996), Recent Developments in Electrical Linewidth and Overlay Metrology for Integrated Circuit Fabrication Processes, Japanese Journal of Applied Physics (Accessed June 16, 2024)

Issues

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Created December 30, 1996, Updated October 12, 2021