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Displaying 2351 - 2375 of 2717

Accuracy Differences Among Photomask Metrology Tools--and Why They Matter

September 1, 1998
Author(s)
James E. Potzick
A variety of different kinds of photomask critical dimension (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have differing cost, throughput

Case Against Optical Gauge Block Metrology

September 1, 1998
Author(s)
Theodore D. Doiron, Dennis S. Everett, Bryon S. Faust, Eric S. Stanfield, John R. Stoup
The current definition of length of a gage block is a very clever attempt to evade the systematic errors associated with the wringing layer thickness and optical phase corrections. In practice, there are very large systematic operator and surface effects

Minimizing Error Sources in Gage Block Mechanical Comparison Measurements

September 1, 1998
Author(s)
Bryon S. Faust, John R. Stoup, Debra K. Stanfield
Error sources in gage block mechanical comparisons can range from classical textbook examples (thermal gradients, correct temperature value, and correct master value) to a completely counter-intuitive example of diamond probe tip wear at low applied force

A System to Measure Current Transducer Performance

July 1, 1998
Author(s)
Bryan C. Waltrip, Thomas L. Nelson
A special purpose ac current transducer measurement system capable of intercomparing transducers with ac output voltage ratios from 1:1 to 50:1 has been developed to extend the range and accuracy of current transformer, current shunt, and mutual inductor

Capacitance and Dissipation Factor Measurements from 1 kHz to 10 MHz

July 1, 1998
Author(s)
Andrew D. Koffman, Bryan C. Waltrip, Nile M. Oldham, S. Avramov
A measurement technique developed by K. Yokoi et al. At Hewlett-Packard Japan, Ltd. Has been duplicated and evaluated at NIST to characterize four-terminal pair capacitors. The technique is based on an accurate three-terminal measurement made at 1 kHz

Accuracy and Traceability in Dimensional Measurements

June 1, 1998
Author(s)
James E. Potzick
Dimensional measurements of importance to microlithography include feature sizes and feature placement on photomasks and wafers, overlay eccentricities, defect and particle sizes on masks and wafers, and many others. A common element is that the object

Developing a Method to Determine Linewidth Based on Counting the Atom-Spacings Across a Line

June 1, 1998
Author(s)
Richard M. Silver, Carsten P. Jensen, V W. Tsai, Joseph Fu, John S. Villarrubia, E C. Teague
We are developing the instrumentation and prototype samples at NIST to enable the counting of atom-spacings across linewidth features etched in silicon. This is an effort to allow the accurate counting of atom-spacings across a feature in a controlled

Measurement of Pitch and Width Samples with the NIST Calibrated Atomic Force Microscope

June 1, 1998
Author(s)
Ronald G. Dixson, R Koning, Theodore V. Vorburger, Joseph Fu, V W. Tsai
Because atomic force microscopes (AFMs) are capable of generating three dimensional images with nanometer level resolution, these instruments are being increasingly used in many industries as tools for dimensional metrology at sub- micrometer length scales

Metrology: Impact on National Economy and International Trade

June 1, 1998
Author(s)
Hratch G. Semerjian, Robert L. Watters
The U.S. Federal Government has a strong role in metrology R&D in the U.S because of its importance to the nation's economy and the Constitutional authority given to the National Institute of Standards and Technology (NIST). However, pressures to maintain

Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology

June 1, 1998
Author(s)
J Allgair, C Archie, W Banke, H Bogardus, J Griffith, H Marchman, Michael T. Postek, L Saraf, J Schlesinger, B Singh, N. Sullivan, L Trimble, Andras Vladar, A Yanof
The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron microscope

NIST Calibration Service for Capacitance Standards at Low Frequencies

April 1, 1998
Author(s)
Yui-May Chang, Summerfield B. Tillett
This document describes the capacitance calibration service provided by NIST, including measurement procedures and systems used to calibrate capacitance standards of nominal values in the range of 0.001 pF to 1 F, at frequencies up to 10 kHz. Discussed are

Summary Report of NIST/MSC Workshop on Traceability in Length

April 1, 1998
Author(s)
Dennis A. Swyt
The National Institute of Standards and Technology, in conjunction with the Measurement Science Conference, conducted an industry-needs workshop on February 4, 1998, on issues with U.S. manufacturing companies, particularly smaller ones, may have in

Analytical/Experimental Study of Vibration of a Room-Sized Airspring-Supported Slab

March 1, 1998
Author(s)
H Amick, B Sennewald, E C. Teague, Brian R. Scace
This paper reports the results of the finite element analysis and in-situ testing of a large-scale (4 m x 10 m) pneumatically isolated concrete slab are reported. The slab was constructed as a design prototype for next generation metrology laboratories at
Displaying 2351 - 2375 of 2717
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