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Accuracy Differences Among Photomask Metrology Tools and Why They Matter

Published

Author(s)

James E. Potzick

Abstract

A variety of different kinds of photomask critical dimensions (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have different cost, throughput, footprint, etc. But how do their potential accuracies differ, and is this important? In this context, the effects of tool resolution, the meaning of measurement accuracy and traceability, the role of standards, and how these fit into the measurement model and affect manufacturing profitability are discussed. These considerations can help in choosing the right tool for the measurement task at hand and in evaluating the measurement results.
Proceedings Title
Proceedings of SPIE, 18th Annual BACUS Symposium on Photomask Technology and Management, Brian J. Grenon, Frank E. Abboud, Editors
Volume
3546
Conference Dates
September 16, 1998
Conference Location
Redwood City, CA
Conference Title
BACUS '98 Special Focus Program On Mask Technology And The 1998 National Technology Roadmap For Semiconductors

Keywords

accuracy, metrology, photomask, resolution, traceability

Citation

Potzick, J. (1998), Accuracy Differences Among Photomask Metrology Tools and Why They Matter, Proceedings of SPIE, 18th Annual BACUS Symposium on Photomask Technology and Management, Brian J. Grenon, Frank E. Abboud, Editors, Redwood City, CA (Accessed March 1, 2024)
Created December 1, 1998, Updated February 19, 2017