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Measurement Uncertainty and Noise in Nanometrology

Published

Author(s)

James E. Potzick

Abstract

The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of nanometrology. The displacement measuring laser heterodyne interferometer is a popular tool in such applications, but measurement errors which may be unimportant in other applications can become significant in measuring such small objects. Measurement uncertainty resulting from interferometer resolution and nonlinearity can be reduced by oversampling and averaging multiple measurements, but only if there is some noise on the measurand. In this paper the optimum noise level is determined and the consequent improvement in measurement uncertainty calculated.
Proceedings Title
International Symposium on Laser Metrology
Conference Dates
October 13-15, 1999
Conference Location
Florianopolis, BR

Keywords

laser interferometer, measurement uncertainty, nanometrology, noise, quantization error

Citation

Potzick, J. (1999), Measurement Uncertainty and Noise in Nanometrology, International Symposium on Laser Metrology, Florianopolis, BR (Accessed July 22, 2024)

Issues

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Created January 1, 1999, Updated February 19, 2017