Algorithms for Calculating Single-Atom Step Heights
Joseph Fu, V W. Tsai, R Koning, Ronald G. Dixson, Theodore V. Vorburger
Recently, measuring Si(111) single atomic steps prompted us to investigate the measuring technique. The section technique is the most popular method for measuring the height. By measuring a simulated Si(111) atomic step, we have found it could have an error as high as 2% due to the misalignment of the measuring axis and sample axis of 0.1 degrees.
atomic force microscope, histogram, orthogonal transformation, Si(111) single steps, stylus