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Search Publications

NIST Authors in Bold

Displaying 5651 - 5675 of 13218

The Atomic-Scale Investigation of Graphene Formation on 6H-SiC(0001)

July 1, 2008
Author(s)
N Guisinger, Gregory M. Rutter, Jason Crain, Christian Heiliger, P First, Joseph A. Stroscio
… stages of ultra high vacuum (UHV) graphitization resulted in the growth of individual graphene sheets on random SiC … further graphitization to multilayer thickness resulted in multiple defects as observed with the STM. We characterize … Journal of Vacuum Science and Technology A …

Designing high electron mobility transistor heterostructures with quantum dots for efficient, number-resolving photon detection

May 1, 2008
Author(s)
Mary A. Rowe, Eric Gansen, M. Greene, Danna Rosenberg, Todd E. Harvey, Mark Su, Robert Hadfield, Sae Woo Nam, Richard P. Mirin
… quantum dots as an optically addressable gate in a field-effect transistor. Our design features a dedicated … charge traps allows us to contain the photoexcited holes in a well-defined plane. We derive an equation for a uniform … Journal of Vacuum Science and Technology B …

Photoresist Cross-sectioning with Negligible Damage using a Dual-beam FIB-SEM: A High Throughput Method for Profile Imaging

November 1, 2007
Author(s)
James Clarke, Martin Schmidt, Ndubuisi George Orji
… Imaging of photoresist cross sections in a focused ion beam (FIB)-scanning electron microscope … (SEM) is demonstrated with negligible damage. An in situ chromium sputtering technique is used to deposit … chromium target suspended over the wafer surface resulting in a less damaging metal deposition step. The subsequent …

Parallel-Plate Rheometer Calibration Using Oil and Lattice Boltzmann Simulation

October 11, 2007
Author(s)
Chiara F. Ferraris, Nicos Martys, M R. Geiker, N V. Muzzatti
… The flow in traditional rotational rheometers is well known and … lattice Boltzman methodology was used to simulate the flow in the modified rheometer. These simulations reproduced the … geometry, thus validating the experimental approach. In addition, these simulations show that small changes in the …

Wavelength bistability in two-section mode-locked quantum-dot diode lasers

June 1, 2007
Author(s)
Mingming M. Feng, N. A. Brilliant, Steven T. Cundiff, Richard Mirin, Kevin L. Silverman
… power and pulse width (6.5 ps) are almost identical in the two lasing modes under optimized conditions. The … IEEE Photonics Technology Letters … Wavelength bistability in two-section mode-locked quantum-dot diode lasers …

Influence of Base Additives on the Reaction Diffusion Front of Model Chemically Amplified Photoresists

January 11, 2007
Author(s)
B D. Vogt, Shuhui Kang, Vivek Prabhu, Ashwin Rao, Eric K. Lin, Sushil K. Satija, Karen Turnquest, Wen-Li Wu
… photoacid catalyzed deprotection reaction-diffusion front in model photoresists was measured by combination of neutron … and Fourier transform infrared spectroscopy. Modulation in the location of the base in reference to the diffusing photoacid catalyst illuminates …

Using Laser-Cooled Atoms as a Focused Ion Beam Source

December 1, 2006
Author(s)
James L. Hanssen, E Dakin, Jabez J. McClelland, M Jacka
… quality focused ion beam using laser-cooled neutral atoms in a magneto-optical trap as an ion source. They show that … values that are better than the state of the art in focused ion beams. The source can be used with a range of … Journal of Vacuum Science and Technology B …

Evidence for Internal Stresses Induced by Nanoimprint Lithography

November 30, 2006
Author(s)
Hyun Wook Ro, Yifu Ding, Hae-Jeong Lee, Daniel R. Hines, Ronald L. Jones, Eric K. Lin, Alamgir Karim, Wen-Li Wu, Christopher L. Soles
… mold leads to internal stresses.At elevated temperatures in the freestanding structures (once the mold has been … from the imprint), there is an accelerated reduction in pattern height in the reverse direction from which the material originally … Journal of Vacuum Science and Technology B …

Exposure Dose Effects on the Reaction-Diffusion Process in Model extreme ultraviolet Photoresists

November 30, 2006
Author(s)
Kristopher Lavery, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, Kwang-Woo Choi
… of exposure dose on the latent image deprotection profile in a model extreme ultraviolet (EUV) photoresist polymer, … into unexposed regions of a photoresist is limited even in the absence of base quencher additives. These fundamental … Journal of Vacuum Science and Technology B …

Characterizing Fiber Bragg Grating Index Profiles to Improve the Writing Process

November 1, 2006
Author(s)
Robert J. Espejo, Mikael Svalgaard, Shellee D. Dyer
… method for identifying both systematic and random errors in a fiber Bragg grating (FBG) writing system and show its … system. We demonstrate the ability to identify errors in the writing process that would not likely be found from a … IEEE Photonics Technology Letters …

Self-Assembled Monolayers: Effect of Chain Length on Nanofriction

September 6, 2006
Author(s)
S Hsieh, S Sambasivan, J V. Sengers, Stephen M. Hsu
… films tend to have lower friction, while more disorder in the films leads to increased friction. This experimental … by Chandross et al., which suggests that defect population in SAMs affects friction. … Journal of Vacuum Science and Technology A …

Effect of Self-Assembled Monolayer Film Order on Nanofriction

May 11, 2006
Author(s)
S Sambasivan, S Hsieh, Daniel A. Fischer, Stephen M. Hsu
… increasingly being explored as potential protective films in devices friction and adhesion. However, accurate … order of a series of SAMs with different chain lengths in order to understand nanofriction measurements. A series of … of lower friction associated with longer chain length in macro-test results. To explain these observations, we use …
Displaying 5651 - 5675 of 13218
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