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Metrology

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Displaying 2426 - 2450 of 2718

Uncertainty Estimation for Multiposition Form Error Metrology

September 1, 1997
Author(s)
William T. Estler, Christopher J. Evans, Lianzhen Shao
We analyze a general multiposition comparator measurement procedure that leads to partial removal of artifact error for a class of problems including roundness metrology, measurement of radial error motions of precision spindles, and figure error metrology

Blind Estimation of Tip Geometry in Scanned Probe Microscopy

August 1, 1997
Author(s)
John S. Villarrubia
Broadening of surface protrusions is a well-known imaging artifact in scanned probe microscope topographs. Blind reconstruction is a method for estimating the tip shape from the image of a tip characterizer, without independent knowledge of the

Experimental Study of Caesium 6PJ+ 6PJ --> 7PJ? + 6S energy pooling collisions and modeling of the excited atom density in the presence of optical pumping and radiation trapping

July 5, 1997
Author(s)
F D. Tomasi, J Huennekens, Zeina J. Kubarych, A Allegrini, A Fioretti, P Verker, S Milosevic
An experimental study of caesium energy pooling collisions at thermal energies, has been carried out in a capillary cell using diode laser excitation. Use of the capillary cell minimizes the effects of radiation trapping, but nonetheless, such effects

A Method to Characterize Overlay Tool Misalignments and Distortions

July 1, 1997
Author(s)
Richard M. Silver, James E. Potzick, Fredric Scire, Christopher J. Evans, Michael L. McGlauflin, Edward A. Kornegay, Robert D. Larrabee
A new optical alignment artifact under development at NIST is described. This structure, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. We

Conference Report: Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects, Gaithersburg, MD, May 20, 1996

July 1, 1997
Author(s)
M E. McKnight, J Martin, Michael Galler, Fern Y. Hunt, R Lipman, Theodore V. Vorburger, A Thompson
To help NIST researchers better understand industry''s needs, four NIST laboratories held a Workshop on Advanced Methods and Models for Appearance of Coatings and Coated Objects on May 20, 1996. The four NIST laboratories are Building and Fire Research

Dimensional Metrology at the Nanometer Level: Combined SEM and PPM

July 1, 1997
Author(s)
Michael T. Postek, H Ho, L Harrison
The National Institute of Standards and Technology (NIST) is currently exploring the potentials afforded by the incorporation of a commercial proximal probe microscope (PPM) operating in the scanning tunneling or atomic force mode into a high resolution

Practical Aspects of Touch Trigger Probe Error Compensation

July 1, 1997
Author(s)
William T. Estler, Steven D. Phillips, Bruce R. Borchardt, Ted Hopp, M Levenson, K Eberhardt, Marjorie A. McClain
We present extensions of our prior work in modeling and correcting for pretravel variation errors in kinematic seat touch-trigger coordinate measuring machine (CMM) probes with straight styli. A simple correction term is shown to account for a range of

Statistical Measure for the Sharpness of the SEM Image

July 1, 1997
Author(s)
Nien F. Zhang, Michael T. Postek, Robert D. Larrabee
Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an

Inexpensive Digital Imaging?

June 1, 1997
Author(s)
Michael T. Postek, Andras Vladar
The capture of digital images through the use of a frame grabber provides tremendous advantages to scanning electron microscopy. Accessory frame grabbers can range in price from very inexpensive to several thousand dollars. This work investigates the

Glass and Dimensional Metrology

April 1, 1997
Author(s)
Theodore D. Doiron
Ordinary glass, even good optical quality glass, will shrink up to 20 micrometers/meter over the first few years after its manufacture. Gages made of glass are therefore not suitable as high accuracy artifacts unless they are calibrated often. Better

High-Speed Grinding - Fundamentals and State of the Art in Europe, Japan, and the USA

April 1, 1997
Author(s)
F Klocke, E Brinksmeier, Christopher J. Evans, T Howes, I Inasaki, E Minke, H Tonshoff, J A. Webster, D Stuff
This paper describes the technological basis and the current state of the art in the field of high speed grinding. The technological fundamentals of high speed grinding are first of all presented on the basis of the kinematics of the chip-forming process

Photomask Metrology in the Era of Neolithography

February 1, 1997
Author(s)
James E. Potzick
The appearance of smaller photomask feature sizes, high density patterns, and optical enhancements such as phase shifters and OPC features, and the increasing importance of subresolution mask characteristics, can render traditional mask metrology

A Differential Wavelength Meter for Laser Tuning

January 1, 1997
Author(s)
Lowell P. Howard, Jack A. Stone Jr.
A simple interferometer for matching the wavelengths of tunable lasers is described. Our interferometer uses the angular dispersion of a diffraction grating at the Littrow angle to produce a tilted wavefront with respect to a reference mirror in an

Benchmarking the Length Measurement Capabilities of the National Institute of Standards and Technology

January 1, 1997
Author(s)
Richard M. Silver, J Land, Jack A. Stone Jr., Ronald G. Dixson, Bryon S. Faust, James E. Potzick, Michael T. Postek, et al
A cross-section of measurements from the Precision Engineering Division within the National Institute of Standards and Technology is benchmarked against other leading National Measurement Institutes. We present a variety of length-related calibration
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