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Michael T. Postek, John S. Villarrubia, Andras Vladar
Advances in fundamental nanoscience, design of nanomaterials, and ultimately manufacturing of nanometer scale products all depend to some degree on the...
Chang Xu, Tao Wu, Ying Mei, Charles M. Drain, J Batteas, Kathryn L. Beers
Tapered copolymer brushes of methyl methacrylate (MMA) and 2-hydroxyethyl methacrylate (HEMA) were synthesized via surface-initiated atom transfer radical...
Youn S. Kang, Lawrence H. Robins, Anthony Birdwell, Alexander J. Shapiro, W. R. Thurber, Mark D. Vaudin, M M. Fahmi, D Bryson, S N. Mohammad
The electronic structure of Si-doped InyGa1-yAs1-xNx films on GaAs substrates, grown bynitrogen-plasma-assisted molecular-beam epitaxy, was examined by...
Steven E. Grantham, Charles S. Tarrio, Shannon B. Hill, Thomas B. Lucatorto
Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade...