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PUBLICATIONS

Sub-bandgap defect states in polycrystalline hafnium oxide and their suppression by admixture of silicon

Published

Author(s)

Nhan V. Nguyen, Martin M. Frank, Albert Davydov, Deane Chandler-Horowitz

Abstract

The crystallinity of atomic layer deposition hafnium oxide was found to be thickness-dependent with the thinnest films being amorphous and thick films being at least partially crystalline. Similar films fabricated by metalorganic chemical vapor deposition are mostly monoclinic. Formation of hafnium silicate by admixture of 20 % Si prevents crystallization. Electronic defects are reflected by an absorption feature 0.2 ' 0.3 eV below the optical band gap. These defects arise in polycrystalline, but not in amorphous, hafnium-based oxides.
Citation
Applied Physics Letters
Volume
87
Pub Type
Journals

Keywords

Bandgap, Crystallization, Defects, Hafnium oxide, Hafnium Silicate, Optical properties

Citation

Nguyen, N. , Frank, M. , Davydov, A. and Chandler-Horowitz, D. (2005), Sub-bandgap defect states in polycrystalline hafnium oxide and their suppression by admixture of silicon, Applied Physics Letters (Accessed April 20, 2024)

Created November 17, 2005, Updated January 27, 2020