Driemeier, C.
, Bastos, K.
, Miotti, L.
, Baumvol, I.
, Nguyen, N.
, Sayan, S.
and Krug, C.
(2005),
Compositional Stability of Hafnium Aluminates Thin Films Deposited on Si by Atomic Layer Deposition, Applied Physics Letters
(Accessed September 16, 2024)
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Compositional Stability of Hafnium Aluminates Thin Films Deposited on Si by Atomic Layer Deposition
Published
Author(s)
C. Driemeier, K P. Bastos, L Miotti, I.J.R. Baumvol, , , C Krug
Citation
Applied Physics Letters
Volume
86
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created November 16, 2005, Updated October 12, 2021