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PUBLICATIONS

Compositional Stability of Hafnium Aluminates Thin Films Deposited on Si by Atomic Layer Deposition

Published

Author(s)

C. Driemeier, K P. Bastos, L Miotti, I.J.R. Baumvol, Nhan Van Nguyen, Safak Sayan, C Krug
Citation
Applied Physics Letters
Volume
86
Pub Type
Journals

Citation

Driemeier, C. , Bastos, K. , Miotti, L. , Baumvol, I. , Nguyen, N. , Sayan, S. and Krug, C. (2005), Compositional Stability of Hafnium Aluminates Thin Films Deposited on Si by Atomic Layer Deposition, Applied Physics Letters (Accessed October 27, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created November 16, 2005, Updated October 12, 2021
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