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Compositional Stability of Hafnium Aluminates Thin Films Deposited on Si by Atomic Layer Deposition

Published

Author(s)

C. Driemeier, K P. Bastos, L Miotti, I.J.R. Baumvol, Nhan Van Nguyen, Safak Sayan, C Krug
Citation
Applied Physics Letters
Volume
86

Citation

Driemeier, C. , Bastos, K. , Miotti, L. , Baumvol, I. , Nguyen, N. , Sayan, S. and Krug, C. (2005), Compositional Stability of Hafnium Aluminates Thin Films Deposited on Si by Atomic Layer Deposition, Applied Physics Letters (Accessed February 28, 2024)
Created November 16, 2005, Updated October 12, 2021