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Conferences

Voltage Modulation Scanned Probe Oxidation (Abstract)

January 1, 1998

Author(s)

John A. Dagata, T Inoue, J Itoh, K Matsumoto, H Yokoyama

This talk describes methods for enhancing the growth rate and electrical characteristics of nanostructures produced on silicon and titanium substrates by...

Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated Atomic Force Microscope

January 1, 1998

Author(s)

Ronald G. Dixson, V W. Tsai, Theodore V. Vorburger, Edwin R. Williams, X Wang, Joseph Fu, R Koning

The presence of the atomic force microscope (AFM) in the industrial metrology setting is rapidly increasing. Properties commonly measured in such applications...

The Study of Silicon Stepped Surfaces as Atomic Force Microscope Calibration Standards With a Calibrated AFM at NIST

January 1, 1998

Author(s)

V W. Tsai, Theodore V. Vorburger, Ronald G. Dixson, Joseph Fu, R Koning, Richard M. Silver, E. C. Williams

Due to the limitations of modern manufacturing technology, there is no commercial height artifact at the sub-nanometer scale currently available. The single...

NIST Microform Calibration - How It Benefits U.S. Industry

January 1, 1998

Author(s)

Jun-Feng Song, Theodore V. Vorburger

In microform metrology, complex 3-D surface features in the micrometer range must be quantified for their space and size including dimensions, curves, angles...

Extinction Coefficients for Dielectric and Conducting Doublets of Spheres

January 1, 1998

Author(s)

Egon Marx

The extinction cross-sections of doublets of polystyrene and carbon spheres are determined using the optical theorem. The forward scattering amplitude is...

The Proposed Smart Transducer Interface Standard

January 1, 1998

Author(s)

Kang B. Lee

A proposed smart transducer interface standard, P1451 is being developed by TC9, Technical Committee on Sensor Technology, of the Instrumentation and...

The Molecular Measuring Machine

January 1, 1998

Author(s)

John A. Kramar, E Gilsinn, E Amatucci, C Villarrubia, E C. Teague, W Scire, William B. Penzes

To help meet the measurement needs of industries preparing to manufacture future generations of nanoelectronic devices and circuits, the National Institute of...

Advances in NIST Standard Rockwell Diamond Indenters

January 1, 1998

Author(s)

Jun-Feng Song, Samuel R. Low III, David J. Pitchure, Theodore V. Vorburger

Recent developments in standard hardness machines and microform calibration techniques have made it possible to establish a worldwide unified Rockwell hardness...

Measurement Traceability of NIST Standard Rockwell Diamond Indenters

January 1, 1998

Author(s)

Jun-Feng Song, Samuel R. Low III, Walter S. Liggett Jr, David J. Pitchure, Theodore V. Vorburger

A metrology-based Rockwell hardness scale is established by a standard machine and a standard diamond indenter. Both must be established through force and...