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Conferences

Testing Displacement-Measuring Interferometer Systems

Author(s)
Jack A. Stone Jr., Martin Schroeck, Michael T. Stocker
We have made a study of one method for testing displacement-measuring interferometer systems, a modified back-to-back comparison, that automatically compensates

Voltage Modulation Scanned Probe Oxidation (Abstract)

Author(s)
John A. Dagata, T Inoue, J Itoh, K Matsumoto, H Yokoyama
This talk describes methods for enhancing the growth rate and electrical characteristics of nanostructures produced on silicon and titanium substrates by

The Molecular Measuring Machine

Author(s)
John A. Kramar, E Gilsinn, E Amatucci, C Villarrubia, E C. Teague, W Scire, William B. Penzes
To help meet the measurement needs of industries preparing to manufacture future generations of nanoelectronic devices and circuits, the National Institute of

Advances in NIST Standard Rockwell Diamond Indenters

Author(s)
Jun-Feng Song, Samuel R. Low III, David J. Pitchure, Theodore V. Vorburger
Recent developments in standard hardness machines and microform calibration techniques have made it possible to establish a worldwide unified Rockwell hardness

Measurement Traceability of NIST Standard Rockwell Diamond Indenters

Author(s)
Jun-Feng Song, Samuel R. Low III, Walter S. Liggett Jr, David J. Pitchure, Theodore V. Vorburger
A metrology-based Rockwell hardness scale is established by a standard machine and a standard diamond indenter. Both must be established through force and

TOTAL TDEV

Author(s)
Marc A. Weiss, David A. Howe
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