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Calibration Wafer for Temperature Measurement in RTP Tools

Published

Author(s)

K G. Kreider, D P. DeWitt, Benjamin K. Tsai, Francis J. Lovas, David W. Allen
Proceedings Title
Intl. Conference: Characterization and Metrology for ULSI Technology
Conference Dates
March 23-27, 1998
Conference Location
Gaithersburg, MD, USA
Conference Title
Proc. Intl. Conference: Characterization and Metrology for ULSI Technology

Citation

Kreider, K. , DeWitt, D. , Tsai, B. , Lovas, F. and Allen, D. (1998), Calibration Wafer for Temperature Measurement in RTP Tools, Intl. Conference: Characterization and Metrology for ULSI Technology , Gaithersburg, MD, USA (Accessed May 20, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 31, 1997, Updated October 12, 2021