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Electron Interactions With Plasma Processing Gases: CF4, CHF3, C2F6, and C3F8

Published

Author(s)

Loucas G. Christophorou, James K. Olthoff

Abstract

A review of our efforts to evaluate and assess electron interaction data for the plasma processing community is presented. Specifically we present in this paper our recommended electron-interaction cross sections for CF4, CHF3, C2F6, and C3F8.
Proceedings Title
Conf. Proc. Symposium on Atomic and Surface Physics and Related Topics
Conference Dates
January 25-30, 1998
Conference Location
Going, 1, AU

Keywords

coefficients, plasma processing, reference data

Citation

Christophorou, L. and Olthoff, J. (1998), Electron Interactions With Plasma Processing Gases: CF<sub>4</sub>, CHF<sub>3</sub>, C<sub>2</sub>F<sub>6</sub>, and C<sub>3</sub>F<sub>8</sub>, Conf. Proc. Symposium on Atomic and Surface Physics and Related Topics, Going, 1, AU, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=16418 (Accessed April 25, 2024)
Created December 31, 1997, Updated October 12, 2021