Christophorou, L.
and Olthoff, J.
(1998),
Electron Interactions With Plasma Processing Gases: CF<sub>4</sub>, CHF<sub>3</sub>, C<sub>2</sub>F<sub>6</sub>, and C<sub>3</sub>F<sub>8</sub>, Conf. Proc. Symposium on Atomic and Surface Physics and Related Topics, Going, 1, AU, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=16418
(Accessed December 14, 2024)
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Electron Interactions With Plasma Processing Gases: CF4, CHF3, C2F6, and C3F8
Published
Author(s)
Loucas G. Christophorou,
Abstract
A review of our efforts to evaluate and assess electron interaction data for the plasma processing community is presented. Specifically we present in this paper our recommended electron-interaction cross sections for CF4, CHF3, C2F6, and C3F8.Proceedings Title
Conf. Proc. Symposium on Atomic and Surface Physics and Related Topics
Conference Dates
January 25-30, 1998
Conference Location
Going, 1, AU
Pub Type
Conferences
Download Paper
Keywords
coefficients, plasma processing, reference data
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 1997, Updated October 12, 2021