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PUBLICATIONS

Electron Interactions With Plasma Processing Gases: CF4, CHF3, C2F6, and C3F8

Published

Author(s)

Loucas G. Christophorou, James K. Olthoff

Abstract

A review of our efforts to evaluate and assess electron interaction data for the plasma processing community is presented. Specifically we present in this paper our recommended electron-interaction cross sections for CF4, CHF3, C2F6, and C3F8.
Proceedings Title
Conf. Proc. Symposium on Atomic and Surface Physics and Related Topics
Conference Dates
January 25-30, 1998
Conference Location
Going, 1, AU
Pub Type
Conferences

Download Paper

Local Download

Keywords

coefficients, plasma processing, reference data
Electronics and Advanced communications

Citation

Christophorou, L. and Olthoff, J. (1998), Electron Interactions With Plasma Processing Gases: CF<sub>4</sub>, CHF<sub>3</sub>, C<sub>2</sub>F<sub>6</sub>, and C<sub>3</sub>F<sub>8</sub>, Conf. Proc. Symposium on Atomic and Surface Physics and Related Topics, Going, 1, AU, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=16418 (Accessed October 13, 2025)

Issues

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Created December 31, 1997, Updated October 12, 2021
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