Christophorou, L.
and Olthoff, J.
(1998),
Electron Interactions With Plasma Processing Gases: CF<sub>4</sub>, CHF<sub>3</sub>, C<sub>2</sub>F<sub>6</sub>, and C<sub>3</sub>F<sub>8</sub>, Conf. Proc. Symposium on Atomic and Surface Physics and Related Topics, Going, 1, AU, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=16418
(Accessed April 19, 2024)
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Electron Interactions With Plasma Processing Gases: CF4, CHF3, C2F6, and C3F8
Published
Author(s)
Loucas G. Christophorou,
Abstract
A review of our efforts to evaluate and assess electron interaction data for the plasma processing community is presented. Specifically we present in this paper our recommended electron-interaction cross sections for CF4, CHF3, C2F6, and C3F8.Proceedings Title
Conf. Proc. Symposium on Atomic and Surface Physics and Related Topics
Conference Dates
January 25-30, 1998
Conference Location
Going, 1, AU
Pub Type
Conferences
Download Paper
Keywords
coefficients, plasma processing, reference data
Citation
Created December 31, 1997, Updated October 12, 2021