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The role of process simulation in microlithography is becoming an increasingly important part of process control as wafer feature sizes become smaller than the...
Ronald G. Dixson, R Koning, Joseph Fu, Theodore V. Vorburger, Thomas B. Renegar
Atomic force microscopes (AFMs) generate three dimensional images with nanometer level resolution and, consequently, are used in the semiconductor industry as...
John S. Villarrubia, Andras Vladar, J R. Lowney, Michael T. Postek, Richard A. Allen, Michael W. Cresswell, Rathindra Ghoshtagore
The effect of the instrument on the measurement must be known in order to generate an accurate linewidth measurement. Although instrument models exist for a...
The modern definition of traceability intimately links the concepts of calibration (i.e., connection to the SI unit) and measurement uncertainty. In a typical...
Improved sample temperature measurement accuracy is demonstrated in a normal-incidence optical reflectance spectroscopy system that has been modified to allow...
The National Institute of Standards and Technology (NIST) has recently administered two interlaboratory comparisons, coordinated within the Fiber Optics...
Mark R. VanLandingham, John S. Villarrubia, G F. Meyers
Regardless of the type of test, reliable indentation measurements require knowledge of the shape of the indenter tip. For indentation measurements involving sub...
We develop a novel four-port equivalent circuit for a coplanar-waveguide-to-microstrip transition using a finite-difference time-domain analysis. The lumped...
Donald C. DeGroot, Paul D. Hale, M. Vanden Bossche, F. Verbeyst, Jan Verspecht
We analyze the input networks of the samplers used in the nose-to-nose calibration method. Our model demonstrates that the required input network conditions are...
The electric fatigue behavior of a commercial lead zirconate titanate (PZT) was investigated by optical microscopy and instrumented Hertzian microindentation...
William R. Blair, Charles M. Guttman, A A. Guiseppetti
Continuing interest at NIST (National Institute of Standards and Technology) in producing MALDI (Matrix Assisted Laser Desorption/Ionization) analyses with a...
Paul D. Hale, Tracy S. Clement, Kevin Coakley, Chih-Ming Wang, Donald C. DeGroot, A. P. Verdoni
We describe estimation of the magnitude and phase response of a sampling oscilloscope over 50 Ghz bandwidth using the nose-to-nose method. The measurements are...
D M. Anderson, William J. Boettinger, Geoffrey B. McFadden, A A. Wheeler
The phase-field model of diffusion-controlled solidification has recently been extended to include the effects of fluid flow in the melt. The phase-field model...
The workshop, Evaluating Collaborative Engerprises, explored the issues surrounding the evaluation of collaborative systems including methods and tools for...
Michael T. Postek, Andras Vladar, Nien F. Zhang, Robert D. Larrabee
Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that...
Michael T. Postek, Andras Vladar, John S. Villarrubia
Metrology will remain a principal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 and l00...
Richard Mirin, Kevin L. Silverman, David H. Christensen
Self-assembled InGaAs quantum dots (QDs) have been intensely studied for the past several years because of the potential applications ranging from low threshold...
Michael W. Cresswell, John E. Bonevich, T J. Headley, Richard A. Allen, Lucille A. Giannuzzi, Sarah C. Everist, Rathindra Ghoshtagore, Patrick J. Shea
Test structures of the type known as cross-bridge resistors have been patterned in (100) epitaxial silicon material that was seeded on Bonded and Etched-Back...
Five photoactivated resins, designated BTHZ, TP, U0H, U66H and U132H, were evaluated for the effects of the chemical structure and compositional variations of...
Michael Gruninger, Barbara L. Goldstein, Kevin G. Brady, Simon Szykman, Charles R. McLean, Joshua Lubell
Advances in information technology are frequently cited as the basis for the continued growth of the U.S. economy. Manufacturers use information technology...
This paper describes the National Advanced Manufacturing Testbed (NAMT) at the National Institute of Standards and Technology (NIST). The NAMT is a distributed...
D. J. Benford, C. A. Allen, A. S. Kutyrev, S. H. Mosely, Rick A. Shafer, James A. Chervenak, Erich N. Grossman, Kent D. Irwin, John M. Martinis, Carl D. Reintsema
Studies of astrophysical emission in the far-infrared and submillimeter will increasingly require large arrays of detectors containing hundreds to thousands of...
Jiann C. Yang, Thomas G. Cleary, Michelle K. Donnelly
Tritluoroiodomethane (CF3I) has been proposed as a potential replacement for Halon 1301 in aircraft engine nacelle and dry bay fire protection applications. The...
H El-Sayed, M Salit, J Travis, J E. Devaney, William L. George
We introduce a parallelization of the maximum-likelihood cosine transform.This transform consists of a computationally intensive iterative fittingprocess, but...
Mark W. Keller, Neil M. Zimmerman, Ali L. Eichenberger, John M. Martinis
We have built a prototype capacitance standard based on single-electron tunneling (SET) devices and a cryogenic vacuum-gap capacitor. We are currently involved...
Optimization of the binding conformation of a substrate in an enzyme active site using ab initio quantum chemistry methods are intractable since the active site...
A compilation of fire test data which shows distinct behaviroal differences between HSC and NSC at elevated temperature is presented. The differences are most...