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Paul W. Witherell, Katherine C. Morris, Anantha Narayanan Narayanan, Jae H. Lee, Sudarsan Rachuri
The synthesis of material information across lifecycle stages will lay the foundation for a material information model to support sustainable decision making...
At the present time, there is a lack of understanding of the performance of structures as complete systems under extreme loading conditions such as realistic...
CIE 191:2010 recommends a mesopic photometry system that defines the spectral luminous efficiency function for peripheral visual tasks. For implementation of...
Christophe Martinsons, Yuqin Zong, C Cameron Miller, Yoshi Ohno
Specific issues appear in the measurement of the electrical power of AC-powered LED lamps and luminaires because they often generate harmonic currents in a wide...
Deogratias Kibira, Yung-Tsun T. Lee, Allison Barnard Feeney, Jennifer L. Marshall, Larry Avery, Jennifer Moore, Carlotta Boone
Emergency medical service providers riding in ambulance patient compartments, while caring for patients, are at high risk of suffering injuries in case of a...
Bryan M. Barnes, Francois R. Goasmat, Martin Y. Sohn, Hui Zhou, Abraham Arceo
To measure the new SEMATECH 9 nm node Intentional Defect Array (IDA) and subsequent small, complex defects, a methodology has been used to exploit the rich...
Wireless sensor networks are being considered for application within buildings to control various equipment in different working environments. As wireless...
Benjamin D. Bunday, Thomas Germer, Victor H. Vartanian, Aaron Cordes, Aron Cepler, Charles Settens
This paper will examine the future for critical dimension (CD) metrology. First we will present the extensive list of applications for which CD metrology...
P J. Phillips, Yi-Chen Chen, Vishal M. Patel, Jaishanker K. Pillai, Rama Chellappa
We propose a novel dictionary-based learning method for ambiguously labeled multiclass classification, where each training sample has multiple labels and only...
Regis J. Kline, Daniel F. Sunday, Chengqing C. Wang, Wen-Li Wu, Charlie Settens, Bunday Benjamin, Brad Thiel, Matyi Richard
Critical dimension small angle X-ray scattering (CD-SAXS) has been identified as a potential solution for measurement of nanoscale lithographic features by...
We describe general methods of estimating uncertainties in antenna measurements. These include estimates based on theory (analysis1), simulation, and altering...
Paul Lemaillet, Thomas Germer, Regis J. Kline, Daniel Sunday, Chengqing C. Wang, Wen-Li Wu
In this paper, we present a comparison of profile measurements of vertical field effect transistor (FinFET) fin arrays by optical critical dimension (OCD)...
David R. Novotny, Josh Gordon, Jason Coder, Michael Francis, Jeffrey R. Guerrieri
The Antenna Metrology Laboratory at the National Institute of Standards and Technology, USA (NIST) is developing a robotically controlled near-field pattern...
Phase 3 of MITRE's Common Weakness Enumeration (CWE) Compatibility and Effectiveness program allows a customer to understand how effective a software assurance...
Liya Yu, Richard J. Kasica, Robert D. Newby, Lei Chen, Vincent K. Luciani
This article demonstrates and evaluates photo/e-beam grayscale complementary lithography processes for the fabrication of large area, high topography grayscale...
Accurate flow measurements are essential to quantifying the amount of greenhouse gases (GHGs) and other pollutants emitted from the smokestacks of coal-fired...
Janet M. Cassard, Jon C. Geist, Craig D. McGray, Richard A. Allen, Muhammad Y. Afridi, Brian J. Nablo, Michael Gaitan, David G. Seiler
This paper presents an overview of the Microelectromechanical Systems (MEMS) 5-in-1 Reference Material (RM), which is a single test chip with test structures...
NIST plays a role in the development of standards for commercial measuring systems that are used in legal metrology in the U.S. NIST Handbook 130 and NIST...
William A. Osborn, Lawrence H. Friedman, Mark D. Vaudin, Stephan J. Stranick, Michael S. Gaither, Justin M. Gorham, Victor H. Vartanian, Robert F. Cook
Richard M. Silver, Bryan M. Barnes, Francois R. Goasmat, Hui Zhou, Martin Y. Sohn
The semiconductor manufacturing industry is now facing serious challenges in achieving defect detection rates with acceptable throughput and accuracy. With...
Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver
With decreasing feature sizes in semiconductor manufacturing, there is an acute demand for measurements of both critical dimensions (CD) and defects on the...
Joseph J. Kopanski, Muhammad Y. Afridi, Chong Jiang, Michael Lorek, Timothy Kohler, Curt A. Richter
The charge based capacitance measurement (CBCM) technique is highly sensitive to small capacitances and capable integration of onto an AFM tip, thereby reducing...
Thomas M. Wallis, Atif A. Imtiaz, Alexandra E. Curtin, Pavel Kabos, Matthew D. Brubaker, Norman A. Sanford, Kristine A. Bertness
The scanning microwave microscope (SMM) is a tool for spatially-resolved microwave characterization of nanoelectronic materials and devices. The microscope...
Jing Qin, Hui Zhou, Bryan M. Barnes, Ronald G. Dixson, Richard M. Silver
Reduced target dimensions requiring improved resolution and sensitivity have driven the need to use and analyze the phase and scattered frequency information...
Jun H. Shin, Boonserm Kulvatunyou, Yunsu Lee, Nenad Ivezic
When an Original Equipment Manufacturer (OEM), which makes a final product for the consumer marketplace by purchasing components from its suppliers, faces...
David R. Kuhn, Itzel (. Dominquez Mendoza, Raghu N. Kacker, Yu Lei
Empirical data demonstrate the value of t-way coverage, but in some testing situations, it is not practical to use covering arrays. However any set of tests...