Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Multiple-order Imaging for Optical Critical Dimension Metrology using Microscope Characterization

Published

Author(s)

Jing Qin, Hui Zhou, Bryan M. Barnes, Francois R. Goasmat, Ronald G. Dixson, Richard M. Silver

Abstract

There has been much recent work in developing advanced optical metrology applications that use imaging optics for optical critical dimension (OCD) measurements, defect detection, and for potential use with in-die metrology applications. We have previously reported quantitative measurements for sub-50 nm CD dense arrays which scatter only the 0th-order specular diffraction component using angle-resolved scatterfield microscopy. Through angle-resolved and focus-resolved imaging, we now access the three-dimensional scattered fields from OCD targets that contain multiple Fourier frequencies. Experimental sensitivity to nanometer scale linewidth changes is presented, supported by simulation studies. A new, more advanced approach to tool normalization is coupled with rigorous electromagnetic simulations and library based regression fitting that potentially enables OCD measurements with sub-nanometer uncertainties for targets that scatter multiple Fourier frequencies.
Proceedings Title
Instrumentation, Metrology, and Standards for Nanomanufacturing IV, Proceedings of SPIE Volume: 7767
Volume
8466
Conference Dates
August 12-17, 2012
Conference Location
San Diego, CA
Conference Title
SPIE Optics & Photonics 2012

Keywords

optical metrology, electromagnetic simulation, frequency domain tool normalization, multiple frequency scattering, evaluate sensitivities and uncertainties, phase sensitive measurements

Citation

Qin, J. , Zhou, H. , Barnes, B. , Goasmat, F. , Dixson, R. and Silver, R. (2012), Multiple-order Imaging for Optical Critical Dimension Metrology using Microscope Characterization, Instrumentation, Metrology, and Standards for Nanomanufacturing IV, Proceedings of SPIE Volume: 7767, San Diego, CA, [online], https://doi.org/10.1117/12.946120 (Accessed February 27, 2024)
Created October 11, 2012, Updated November 10, 2018