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Industry Impacts

Nanolithography Design Tools

Accurate production of nanoscale features on semiconductor chips is essential to their performance, but typical design tools cater to the dominance of straight

Projects and Programs


Layer-by-Layer Thinning of MoS2 via Laser Irradiation

Bien Cuong Tran Khac, Ryan M. White, Frank W. DelRio, Koo-hyun Chung
Layer-by-layer thinning of molybdenum disulfide (MoS2) via laser irradiation was examined using Raman spectroscopy and atomic force microscopy. In particular

Subnanometer localization accuracy in widefield optical microscopy

Craig R. Copeland, Jon C. Geist, Craig D. McGray, Vladimir A. Aksyuk, James A. Liddle, Bojan R. Ilic, Samuel M. Stavis
The common assumption that precision is the limit of accuracy in localization microscopy and the typical absence of comprehensive calibration of optical

Nanoscale mapping and spectroscopy of non-radiative hyperbolic modes in hexagonal boron nitride nanostructures

Lisa Brown, Marcelo I. Davanco, Zhiyuan Sun, Andrey Kretinin, Yiguo Chen, Joseph Matson, Igor Vurgaftman, Nicholas Sharac, Alexander Giles, Michael Fogler, Takashi Taniguchi, Kenji Watanabe, Kostya Novoselov, Stefan Maier, Andrea Centrone, Joshua D. Caldwell
Because of its inherent crystal anisotropy, hexagonal boron nitride (hBN) supports naturally hyperbolic phonon polaritons, i.e. polaritons that can propagate

Tools and Instruments