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Search Publications by: Steven Grantham (Fed)

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Displaying 1 - 25 of 63

Laser Calibration for Powder Bed Fusion Additive Manufacturing Process

July 27, 2022
Author(s)
Ho Yeung, Steven Grantham
Laser powder bed fusion systems use a high-power laser, steered by two galvanometer mirrors to scan a pattern on metal powder layers. The laser spot size, position, and synchronization between the laser power and position are critical to the build quality

NIST Traveling Tunable Laser Projector (TTLP) for UV-Blue Disinfection Dose Determinations

June 21, 2022
Author(s)
Thomas C. Larason, Steven Grantham, Clarence Zarobila, Yuqin Zong, C Cameron Miller, Michael Schuit, Brian Holland, Stewart Wood, Melissa Krause
As COVID-19 was overtaking the world in the spring of 2020, the National Institute of Standards and Technology began collaborating with the National Biodefense Analysis and Countermeasures Center to study the inactivation of SARS-CoV-2 to different UV and

The Irradiance Instrument Subsystem (IRIS) on the Airborne-Lunar Spectral Irradiance (Air-LUSI) Instrument

March 23, 2022
Author(s)
Steven Grantham, Thomas C. Larason, Clarence Zarobila, Stephen Maxwell, John Woodward, Kevin Turpie, S. Andrew Gadsden
The objective of the airborne LUnar Spectral Irradiance (air-LUSI) project is to make low uncertainty, SI-traceable measurements of the lunar spectral irradiance in the visible to near-infrared (VNIR) region from an aircraft above most of the optically

Measurement Uncertainty of Surface Temperature Distributions for Laser Powder Bed Fusion Processes

August 10, 2021
Author(s)
David Deisenroth, Sergey Mekhontsev, Brandon Lane, Leonard M. Hanssen, Ivan Zhirnov, Vladimir Khromchenko, Steven Grantham, Daniel Cardenas-Garcia, Alkan Donmez
This paper describes advances in measuring the characteristic spatial distribution of surface temperature and emissivity during laser-metal interaction under conditions relevant for laser powder bed fusion (LPBF) additive manufacturing processes. Detailed

Optical and Mechanical Design of a Telescope for Lunar Spectral Irradiance Measurements from a High-Altitude Aircraft

September 8, 2020
Author(s)
Clarence Zarobila, Steven Grantham, Steven W. Brown, John T. Woodward IV, Stephen Maxwell, Dana R. Defibaugh, Thomas C. Larason, Kevin Turpie
We have designed a non-imaging telescope for measurement of the spectral irradiance of the moon. The telescope was integrated into a wing pod of a NASA ER-2 research aircraft to measure lunar spectral irradiance during flight. The telescope and support

Transient Laser Energy Absorption, Co-axial Melt Pool Monitoring, and Relationship to Melt Pool Morphology

August 16, 2020
Author(s)
Brandon M. Lane, Ivan Zhirnov, Sergey Mekhontsev, Steven E. Grantham, Richard E. Ricker, Santosh Rauniyar, Kevin Chou
Many recent and ongoing studies into the complex melt pool physics during laser powder bed fusion (LPBF) metal additive manufacturing (AM) process measure various aspects of energy transport surrounding the laser-induced melt pool, with focus on laser

Influence of optical system operation on stability of single tracks in selective laser melting

August 20, 2019
Author(s)
Ivan Zhirnov, Igor Yadroitsev, Brandon Lane, Sergey Mekhontsev, Steven Grantham, Ina Yadroitsava
Additive manufacturing (AM) technologies are increasingly being studied and introduced into the modern industry, but for wide applications there exists some "lack of confidence" about the quality of the parts produced by AM. This distrust has an objective

Design, Developments, and Results from the NIST Additive Manufacturing Metrology Testbed (AMMT)

August 10, 2016
Author(s)
Brandon M. Lane, Sergey Mekhontsev, Steven E. Grantham, Mihaela Vlasea, Justin G. Whiting, Ho Yeung, Jason C. Fox, Clarence J. Zarobila, Jorge E. Neira, Michael L. McGlauflin, Leonard M. Hanssen, Shawn P. Moylan, M A. Donmez, Joseph P. Rice
NIST is developing a facility titled the Additive Manufacturing Metrology Testbed that will enable advanced research into monitoring, controls, process development, and temperature measurement for laser powder bed fusion additive manufacturing and similar

Optical design and initial Results from NIST’s AMMT/TEMPS Facility

May 9, 2016
Author(s)
Steven E. Grantham, Brandon M. Lane, Jorge E. Neira, Sergey Mekhontsev, Leonard M. Hanssen, Mihaela Vlasea
NIST’s Physical Measurement and Engineering Laboratories are jointly developing the Additive Manufacturing Measurement Testbed (AMMT)/ Temperature and Emittance of Melts, Powders and Solids (TEMPS) facilities. These facilities will be co-located on an open

Development and evaluation of interface-stabilized and reactive-sputtered oxide-capped multilayers for EUV lithography

March 16, 2015
Author(s)
Michael Kriese, Jim Rodriguez, Gary Fournier, Steven Grantham, Shannon B. Hill, John J. Curry, Charles Tarrio, Yuriy Platonov
A critical component of high-performance EUV lithography source optics is the reflecting multilayer coating. The ideal multilayer will have both high reflectance and high stability to thermal load. Additionally the capping layers must provide resistance to

Development of an EUVL collector with infrared radiation suppression

August 1, 2014
Author(s)
Steven E. Grantham, Mike Kriese, Yuriy Platonov, Bodo Ehlers, Licai Jiang, Jim Rodriguez, Mueller Ulrich, Shayna khatri, Adam Magruder, Charles S. Tarrio
Laser-produced plasma (LPP) sources for extreme ultraviolet lithography (EUVL) systems utilize CO2 lasers operating with wavelength 10.6μm. Since multilayer-coated optics have high reflectivity for this infrared radiation (IR), a significant and

Improved measurement capabilities at the NIST EUV Reflectometry Facility

August 1, 2014
Author(s)
Charles S. Tarrio, Steven E. Grantham, Thomas A. Germer, Jack C. Rife, Thomas B. Lucatorto, Mike Kriese, Yuriy Platonov, Licai Jiang, Jim Rodriguez
The NIST Extreme Ultraviolet (EUV) Reflectometry Facility was designed in the 1990s to accommodate the largest multilayer optics envisioned at that time. However, with increasing power requirements for an EUV scanner, source collection optics have grown

A synchrotron beamline for extreme-ultraviolet photoresist testing

September 30, 2011
Author(s)
Charles S. Tarrio, Steven E. Grantham, Shannon B. Hill, Nadir S. Faradzhev, Lee J. Richter, Chester Knurek, Thomas B. Lucatorto
Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be evaluated for sensitivity and tested to ensure that they will not contaminate the scanner optics. The new NIST facility described here provides data on the contamination

SURF III: A flexible Synchrotron Radiation Source for Radiometry and Research

September 1, 2011
Author(s)
Uwe Arp, Charles W. Clark, Lu Deng, Nadir S. Faradzhev, Alex P. Farrell, Mitchell L. Furst, Steven E. Grantham, Edward W. Hagley, Shannon B. Hill, Thomas B. Lucatorto, Ping-Shine Shaw, Charles S. Tarrio, Robert E. Vest
The calculability of synchrotron radiation (SR) makes electron storage rings wonderful light sources for radiometry. The broadband nature of SR allows coverage of the whole spectral region from the x-ray to the far-infrared. Compact low-energy storage

The NIST EUV facility for advanced photoresist qualification using the witness-sample test

August 29, 2011
Author(s)
Steven E. Grantham, Charles S. Tarrio, Shannon B. Hill, Lee J. Richter, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute of

Optics contamination studies in support of high-throughput EUV lithography tools

March 25, 2011
Author(s)
Shannon B. Hill, Fardina Asikin, Lee J. Richter, Steven E. Grantham, Charles S. Tarrio, Thomas B. Lucatorto, Sergiy Yulin, Mark Schurmann, Viatcheslav Nesterenko, Torsten Feigl
We report on optics contamination rates induced by exposure to broad-bandwidth, high-intensity EUV radiation peaked near 8 nm in a new beamline at the NIST synchrotron. The peak intensity of 50 mW/mm2 allows extension of previous investigations of

A Novel Wafer-plane Dosimeter for EUV Lithography

November 1, 2009
Author(s)
Steven E. Grantham, Charles S. Tarrio
Extreme Ultraviolet Lithography (EUVL) incorporates 13.5 nm light for patterning wafers and requires in-situ wafer-plane dosimetry that can be tailored to the requirements of an EUVL stepper’s environment. There are several types of detectors that are

At-Wavelength Metrology for EUV Lithography at NIST

July 14, 2009
Author(s)
Charles S. Tarrio, Steven E. Grantham, Robert E. Vest, Thomas B. Lucatorto
The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mirror

Measuring Pulse Energy With Solid-State Photodiodes

April 10, 2009
Author(s)
Robert E. Vest, Shannon B. Hill, Steven E. Grantham
With the advent of extreme ultraviolet lithography (EUVL) the measurement of the energy contained in pulses of short-wavelength radiation is becoming increasingly important. Even low average power sources can deliver pulses of radiation with high peak

EUVL dosimetry at NIST

March 13, 2009
Author(s)
Charles S. Tarrio, Steven E. Grantham, Marc J. Cangemi, Robert E. Vest, Thomas B. Lucatorto, Noreen Harned
As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts. Recently, we undertook a major effort in accurately measuring the sensitivity of three extreme