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Search Publications by: Eric K. Lin (Fed)

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Displaying 276 - 300 of 392

Chemically Amplified Resist Fundamentals Studies by Combinatorial approaches

March 1, 2003
Author(s)
M Wang, Vivek Prabhu, Eric K. Lin, Michael J. Fasolka, Alamgir Karim
Sub-100 nm lithography requires more understanding of photoresist material properties and processing conditions to achieve necessary critical dimension control of patterned structures. As resist thickness and feature linewidth decrease, fundamental

Characterization of Chemical-Vapor-Deposited Low-K Thin Films Using X-Ray Porosimetry

February 1, 2003
Author(s)
V. J. Lee, Eric K. Lin, Barry J. Bauer, Wen-Li Wu, B K. Hwang, W D. Gray
Trimethylsilane based carbon doped silica films prepared with varying chemical vapor deposition process conditions were characterized using x-ray reflectivity and porosimetry to measure the film thickness, average film density, density depth profile, wall

Incoherent Neutron Scattering and the Dynamics of Thin Film Photoresist Polymers

February 1, 2003
Author(s)
Christopher L. Soles, Jack F. Douglas, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Wen-Li Wu, D M. Goldfarb, M Angelopoulos
Elastic incoherent neutron scattering is employed to parameterize changes in the atomic/molecular mobility in lithographic polymers as a function of film thickness. Changes in the 200 MHz and faster dynamics are estimated in terms of a harmonic oscillator

Polymer Dynamics and Diffusive Properties in Ultra-Thin Photoresist Films

February 1, 2003
Author(s)
Christopher L. Soles, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Vivek M. Prabhu, Wen-Li Wu, Eric K. Lin, D L. Goldfarb, M Angelopoulos
A series of experiments are presented to demonstrate thin film confinement effects on the diffusive properties in poly(tert-butoxycarboxystyrene) (PBOCSt). Bilayer diffusion couple measurements reveal that as the thickness of a PBOCSt film is decreased

X-Ray Absorption Spectroscopy to Probe Interfacial Issues in Photolithography

February 1, 2003
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A. Fischer, S Sambasivan, Eric K. Lin, Ronald L. Jones, Christopher Soles, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
Control of the shape, critical dimension (CD), and roughness is critical for the fabrication of sub 100 nm features, where the CD and roughness budget are approaching the molecular dimension of the resist polymers1. Here we utilize near edge X-ray

Chain Conformation in Ultrathin Polymer Films

December 1, 2002
Author(s)
Ronald L. Jones, Christopher Soles, Francis W. Starr, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, D L. Goldfarb, M Angelopolous
Using Small Angle Neutron Scattering (SANS), we present the first quantitative measurements of the 3-dimensional conformation of macromolecules in thin polymer films of D RG,Bulk. Where D is the film thickness and RG,Bulk is the bulk radius of gyration

Measurement of the Spatial Evolution of the Deprotection Reaction Front With Nanometer Resolution Using Neutron Reflectometry

December 1, 2002
Author(s)
Eric K. Lin, Sushil K. Satija, Wen-Li Wu, Christopher L. Soles, D L. Goldfarb, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Willson
The use of chemically amplified photoresists for the fabrication of sub-100 nm features will require spatial control with nanometer level resolution. To reach this goal, a detailed understanding of the complex reaction-diffusion mechanisms at these length