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Publications

Search Publications by William F Guthrie

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Displaying 26 - 50 of 96

Nodal Analysis Estimates of Fluid Flow from the BP Macondo MC252 Well

March 10, 2011
Author(s)
George Guthrie, Rajesh Pawar, Curt Oldenburg, Todd Weisgraber, Grant Bromhal, Phil Gauglitz, John Bernardin, David Dixon, Rick Kapernick, Bruce Letellier, Brett Okhuysen, Robert Reid, Barry M. Freifeld, Karsten Pruess, Lehua Pan, Stefan Finsterle, George J. Moridis, Matthew T. Reagan, Thomas A. Buscheck, Christopher M. Spadaccini, Roger D. Aines, Brian Anderson, Robert Enick, Roy Long, Shahab Mohaghegh, Bryan Morreale, Neal Sams, Doug Wyatt, L A. Mahoney, J A. Bamberger, J Blanchard, J Bontha, C W. Enderlin, J A. Fort, P A. Meyer, Y Onishi, D M. Pfund, D R. Rector, M L. Stewart, B E. Wells, S T. Yokuda, Antonio M. Possolo, William F. Guthrie, Pedro I. Espina
The Nodal-Analysis Team within the Flow Rate Technical Group predicted the flow-related pressure drops from the reservoir to release points to estimate flow rates for various time periods for the Macondo well. These estimates were based on predictions from

Interlaboratory Study of Alternate Filter Papers for Use in ASTM E 2187

December 11, 2009
Author(s)
Richard G. Gann, William F. Guthrie
ASTM E 2187 has become the internationally referenced standard for designing and specifying less fire-prone cigarettes. In this test method, a lit cigarette is laid on multiple layers of filter paper, and the observer identifies whether the cigarette burns

Comparison of Clinical Methods with Isotope Dilution ICP-MS for the New Standard Reference Material 955c Lead In Caprine Blood

May 26, 2009
Author(s)
Karen E. Murphy, Thomas W. Vetter, Gregory C. Turk, Christopher D. Palmer, Miles E. Lewis, Ciaran M. Geraghty, Patrick J. Parsons, William F. Guthrie
The National Institute of Standards and Technology (NIST) has developed Standard Reference Material (SRM) 955c, a new caprine-based, four-level blood standard with certified blood lead levels (BLLs) ranging from 0.4 µg/dL (0.02 µmol/L) Pb to 45 µg/dL (2.17

Three Statistical Paradigms for the Assessment and Interpretation of Measurement Uncertainty

January 12, 2009
Author(s)
William F. Guthrie, Hung-Kung Liu, Andrew L. Rukhin, Blaza Toman, Chih-Ming Wang, Nien F. Zhang
The goals of this chapter are to present different approaches to uncertainty assessment from a statistical point of view and to relate them to the methods that are currently being used in metrology or are being developed within the metrology community. The

Certification of SRM 46H

January 1, 2008
Author(s)
Chiara F. Ferraris, William F. Guthrie, Max A. Peltz, Robin K. Haupt
The standard reference material (SRM) for fineness of cement, SRM 114, is an integral part of the calibration material routinely used in the cement industry to qualify cements. Since 1934, NIST has provided SRM 114 for cement fineness testing and it will

Comparison of SEM and HRTEM CD Measurements Extracted from Test-Structures Having Feature Linewidths from 40 nm to 240 nm

January 1, 2008
Author(s)
Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Christine E. Murabito, Ronald G. Dixson, Amy Hunt
CD (Critical Diminsion) measurements have been extracted from SEM (Scanning Electron Microscopy) and HRTEM (High Resolution Transmission Electron Microscopy) images of the same set of monocrystalline silicon features having linewidths between 40 nm and 240

Nano- and Atomic-Scale Length Metrology

December 14, 2007
Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Joseph Fu, Ndubuisi G. Orji, Shaw C. Feng, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Wei Chu

Interlaboratory Comparisons

December 10, 2007
Author(s)
William F. Guthrie
An interlaboratory comparison for a measurement procedure is an exercise carried out by a group of laboratories to compare their performance or assess a measurement standard. Interlaboratory comparisons are typically used for one of three main purposes, to

Effect of Static Analysis Tools on Software Security: Preliminary Investigation

October 29, 2007
Author(s)
Vadim Okun, William F. Guthrie, Romain Gaucher, Paul E. Black
Static analysis tools can handle large-scale software and find thousands of defects. But do they improve software security? We evaluate the effect of static analysis tool use on software security in open source projects. We measure security by

Development of Certified Reference Materials of Ion-Implanted Dopants in Silicon for Calibration of Secondary Ion Mass Spectrometers

January 1, 2007
Author(s)
David S. Simons, Robert G. Downing, George P. Lamaze, Richard M. Lindstrom, Robert R. Greenberg, Rick L. Paul, Susannah Schiller, William F. Guthrie
Certified reference materials have been developed for calibration of the concentrations of the most common dopants used in silicon semiconductor technology boron, arsenic, and phosphorus. These materials consist of a single dopant species that is

Calcium Phosphate Cement With Non-Rigidity and Strength Durability for Periodontal Bone Repair

August 1, 2006
Author(s)
Hockin D. Xu, Shozo Takagi, Limin Sun, L A. Hussain, Laurence C. Chow, William F. Guthrie, James H. Yen
Background. The need for biomaterials to treat periodontal osseous defects has increased as the world population ages. The objective of the present study was to develop a self-hardening, resorbable, and mech/anically strong calcium phosphate cement (CPC)

Certification of SRM 114q: Part I

June 14, 2006
Author(s)
Chiara F. Ferraris, William F. Guthrie, A Aviles, Robin K. Haupt, Bruce S. MacDonald
The standard reference material (SRM) for fineness of cement, SRM 114, is an integral part of the calibration material routinely used in the cement industry to qualify cements. Being a powder, the main physical properties of cement, prior to hydration, are

Certification of SRM 114q: Part II

June 14, 2006
Author(s)
Chiara F. Ferraris, Max A. Peltz, William F. Guthrie, A Aviles, Robin K. Haupt, Bruce S. MacDonald
The standard reference material (SRM) for fineness of cement, SRM 114, is an integral part of the calibration material routinely used in the cement industry to qualify cements. Being a powder, the main physical properties of cement, prior to hydration, are

k=2 and Other Sometimes Hidden Assumptions in Chemical Measurement Uncertainty Intervals

April 24, 2006
Author(s)
David L. Duewer, S L. Ellison, William F. Guthrie, D B. Hibbert, C Jackson, A Kallner, Stefan D. Leigh, Reenie M. Parris, Kenneth W. Pratt, Michele M. Schantz, Katherine E. Sharpless
A recent interlaboratory study that required individual analysts to estimate uncertainty intervals for their results revealed that some experienced chemical analysts have difficulty with measurement uncertainty calculations. To help validate assumptions

Traceable Atomic Force Microscope Dimensional Metrology at NIST

March 1, 2006
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, Michael W. Cresswell, Richard A. Allen, William F. Guthrie
The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. There are two major instruments being used for traceable measurements at NIST. The first is a custom in-house

Nano- and Atomic-Scale Length Metrology

January 1, 2006
Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Joseph Fu, Ndubuisi G. Orji, Shaw C. Feng, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Wei Chu
We discuss nano-scale length metrology of linewidth, step height, and line edge roughness (LER). These properties are of growing importance to the function and specification of semiconductor devices as the dimensions of semiconductor devices shrink to the

Critical Dimension Reference Features with Sub-Five Nanometer Uncertainty

May 30, 2005
Author(s)
Michael W. Cresswell, Ronald G. Dixson, William F. Guthrie, Richard A. Allen, Christine E. Murabito, Brandon Park, Joaquin (. Martinez, Amy Hunt
The implementation of a new type of HRTEM-imaging (High-Resolution Transmission Electron Microscopy) test structure, and the use of CD-AFM (CD-Atomic Force Microscopy) to serve as the transfer metrology have resulted in reductions in the uncertainties

Comparison of SEM and HRTEM CD-Measurements Extracted from Monocrystalline Tes-Structures Having Feature Linewidths from 40 nm to 240 nm

April 18, 2005
Author(s)
Michael W. Cresswell, Brandon Park, Richard A. Allen, William F. Guthrie, Ronald G. Dixson, Wei Tan, Christine E. Murabito
CD measurements have been extracted from SEM and HRTEM images of the same set of monocrystalline silicon features having linewidths between 40 and 200 nm. The silicon features are incorporated into a new test structure which has been designed to facilitate

Comparison of SEM and HRTEM CD-Measurements Extracted From Monocrystalline Tes-Structures Having Feature Linewidths From 40 nm to 240 nm

April 4, 2005
Author(s)
W Tan, Robert Allen, Michael W. Cresswell, Christine E. Murabito, B C. Park, Ronald G. Dixson, William F. Guthrie
CD measurements have been extracted from SEM and HRTEM images of the same set of monocrystalline silicon features having linewidths between 40 and 200 nm. The silicon features are incorporated into a new test structure which has been designed to facilitate

Report of Investigation of RM 8111: Single-Crystal Critical Dimension Prototype Reference Materials

March 2, 2005
Author(s)
Michael W. Cresswell, Richard A. Allen, Ronald G. Dixson, William F. Guthrie, Christine E. Murabito, Brandon Park, Joaquin (. Martinez
Staff of the Semiconductor Electronics Division, the Information Technology Laboratory, and the Precision Engineering Laboratory at NIST, in collaboration with VLSI Standards, Inc., of San Jose, California, have developed a new generation of prototype